Inventor
Tomoo Nakayama
Inventor
Ibaraki, JP
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices24%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation15%
H10DInorganic electric semiconductor devices12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
G02BOptical elements, systems or apparatus9%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%
B08BCleaning in general3%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
H01JElectric discharge tubes or discharge lamps3%
PatentTitleYear
10,818,813Semiconductor device and manufacturing method thereof202010,714,330Method for manufacturing a semiconductor device having a step of performing ion implantation using a resist pattern as a mask202010,553,734Semiconductor device and manufacturing method thereof202010,355,161Germanium-based photoreceiver having tungsten contacts201910,211,352Germanium photodiode201910,121,927Semiconductor device and method of manufacturing the same201810,084,078Semiconductor device and method of manufacturing same20189,589,954'Semiconductor device having recess filled with insulating material provided between source/drain impurity region and gate insulator'20178,293,653'Method of manufacturing a semiconductor device'20127,862,736'Method of cleaning plasma etching apparatus, and thus-cleanable plasma etching apparatus'20117,510,981'Method for manufacturing semiconductor device'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2012Based in Kanagawa, JP· patent location history
2012–2020Patents assigned to RENESAS ELECTRONICS CORP (9)· patent assignee history
2012Patents assigned to FUJIKURA EIICHI (1)· patent assignee history
2012Patents assigned to KASAMA YOSHIKO (1)· patent assignee history
2012Patents assigned to KIKUCHI ATSUSHI (1)· patent assignee history
2012Patents assigned to NAKAYAMA TOMOO (1)· patent assignee history
2017–2020Based in Ibaraki, JP· patent location history
2018Based in Hitachinaka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| RENESAS ELECTRONICS CORP | 9 | 2012–2020 |
| FUJIKURA EIICHI | 1 | 2012 |
| KASAMA YOSHIKO | 1 | 2012 |
| KIKUCHI ATSUSHI | 1 | 2012 |
| NAKAYAMA TOMOOself | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ibaraki, JP | 7 | 2017–2020 |
| Kanagawa, JP | 3 | 2009–2012 |
| Hitachinaka, JP | 1 | 2018 |