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Inventor

Sebastian Strobel

Inventor
Aalen, DE

Overview

3→
Patents
2018–2019
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus38%
G21KHandling of particles or ionising radiation not otherwise provided for38%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
PatentTitleYear
10,423,073Method for producing a mirror element201910,203,435EUV mirror and optical system comprising EUV mirror20199,915,873'Reflective optical element, and optical system of a microlithographic projection exposure apparatus'2018

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2018–2019Patents assigned to ZEISS CARL SMT GMBH (3)· patent assignee history
2018–2019Based in Aalen, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ZEISS CARL SMT GMBH32018–2019
Locations
LocationPatentsSpan
Aalen, DE32018–2019