Inventor
Felix Godfried Peter Peeters
Inventor
Lieshout, NL
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices54%
A61BDiagnosis12%
B60QArrangement of signalling or lighting devices, the mounting or supporting thereof or circuits therefor, for vehicles in general4%
B60TVehicle brake control systems or parts thereof4%
B62JCycle saddles or seats4%
F16FSprings4%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light4%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
G02BOptical elements, systems or apparatus4%
G21KHandling of particles or ionising radiation not otherwise provided for4%
PatentTitleYear
10,705,432Lithographic apparatus and device manufacturing method202010,234,768Lithographic apparatus and device manufacturing method20199,989,861Lithographic apparatus and device manufacturing method20189,829,799Lithographic apparatus and device manufacturing method20179,568,840'Lithographic apparatus and device manufacturing method'20179,304,401'Measurement of the position of a radiation beam spot in lithography'20169,207,543'Lithographic apparatus and device manufacturing method involving a groove to collect liquid'20158,755,033'Lithographic apparatus and device manufacturing method involving a barrier to collect liquid'20148,704,998'Lithographic apparatus and device manufacturing method involving a barrier to collect liquid'20148,693,621'Source and/or detector positioning system'20148,325,879'Filter assembly for computed tomography systems'20128,260,505'Apparatus and method for determining roll angle of a motorcycle'20128,213,568'Dynamic collimation in cone beam computed tomography to reduce patient exposure'20127,898,642'Lithographic apparatus and device manufacturing method'20117,884,920'Lithographic apparatus and pivotable structure assembly'20117,612,867'Lithographic apparatus'20097,423,730'Lithographic apparatus'20087,365,473'Method for displacing a movable element by means of a least two actuators facing each other and positioned on a stator, as well as a wave motor, displacing device and assembly'20087,248,339'Lithographic apparatus and device manufacturing method'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2020Patents assigned to ASML NETHERLANDS BV (14)· patent assignee history
2007–2020Based in Lieshout, NL· patent location history
2008–2012Patents assigned to KONINKL PHILIPS ELECTRONICS NV (4)· patent assignee history
2008–2012Based in Eindhoven, NL· patent location history
2012–2016Patents assigned to PEETERS FELIX GODFRIED PETER (6)· patent assignee history
2012–2016Based in Heide, NL· patent location history
2014Patents assigned to BASELMANS JOHANNES JACOBUS MATHEUS (2)· patent assignee history
2014Patents assigned to DONDERS SJOERD NICOLAAS LAMBERTUS (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 14 | 2007–2020 |
| PEETERS FELIX GODFRIED PETERself | 6 | 2012–2016 |
| KONINKL PHILIPS ELECTRONICS NV | 4 | 2008–2012 |
| BASELMANS JOHANNES JACOBUS MATHEUS | 2 | 2014 |
| DONDERS SJOERD NICOLAAS LAMBERTUS | 2 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Lieshout, NL | 13 | 2007–2020 |
| Heide, NL | 3 | 2012–2016 |
| Eindhoven, NL | 3 | 2008–2012 |