Inventor

James C. P. Leung

Inventor

Hong Kong, CN

Overview

2004–2020

Patent span

LOC

Primary field

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

LOC26primary

LOC2646%

B01FMixing, e.g. dissolving, emulsifying or dispersing8%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry8%

C23CCoating metallic material8%

F16KValves8%

G01FMeasuring volume, volume flow, mass flow or liquid level8%

G01NInvestigating or analysing materials by determining their chemical or physical properties8%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2004Patents assigned to MASSACHUSETTS INST TECHNOLOGY (1)· patent assignee history

2004Based in Weston, MA, US· patent location history

2007–2008Patents assigned to MASTERWISE INTERNAT LTD (5)· patent assignee history

2007–2010Based in Hong Kong, CN· patent location history

2007–2008Based in New Territories, CN· patent location history

2010Patents assigned to COLEMAN CO (1)· patent assignee history

2020Patents assigned to LAM RES CORP (1)· patent assignee history

2020Based in San Jose, CA, US· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MASTERWISE INTERNAT LTD	5	2007–2008
COLEMAN CO	1	2010
LAM RES CORP	1	2020
MASSACHUSETTS INST TECHNOLOGY	1	2004

Locations