Inventor
Chang-Gyoun Kim
Inventor
Daejeon, KR
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Fprimary
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium21%
C23CCoating metallic material18%
C30BSingle-crystal growth11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
B82BNanostructures formed by manipulation of individual atoms, molecules, or limited collections of atoms or molecules as discrete units7%
C07CAcyclic or carbocyclic compounds7%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry4%
B82YSpecific uses or applications of nanostructures4%
C01BNon-metallic elements4%
D01FChemical features in the manufacture of artificial filaments, threads, fibres, bristles or ribbons4%
PatentTitleYear
10,858,379Metal precursor for making metal oxide20209,790,238'Strontium precursor, method for preparing same, and method for forming thin film by using same'20178,398,948'Method of preparing carbon nanotube from liquid phased-carbon source'20138,030,507'Tin amino-alkoxide complexes and process for preparing thereof'20117,659,215'Method of depositing nanolaminate film for non-volatile floating gate memory devices by atomic layer deposition'20107,462,732'Volatile nickel aminoalkoxide complex and deposition of nickel thin film using same'20086,982,341'Volatile copper aminoalkoxide complex and deposition of copper thin film using same'20066,329,540'Volatile organogallium compound and deposition of gallium nitride film using same'20016,156,916'Volatile organometallic compound containing a divalent metal and a group 13 metal, process for preparing same, and process for preparing a heterometallic oxide film using same'20005,998,644'Volatile organometallic compound containing a divalent metal and a group 13 metal, process for preparing same, and process for preparing a heterometallic oxide film using same'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2013Patents assigned to KOREA RES INST CHEM TECH (7)· patent assignee history
1999–2020Based in Daejeon, KR· patent location history
2013Patents assigned to CHANG HYUN-JU (1)· patent assignee history
2013Patents assigned to CHOI YOUNG-MIN (1)· patent assignee history
2013Patents assigned to JUNG HA-KYUN (1)· patent assignee history
2017–2020Patents assigned to KOREA RES INST CHEMICAL TECH (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KOREA RES INST CHEM TECH | 7 | 1999–2013 |
| KOREA RES INST CHEMICAL TECH | 2 | 2017–2020 |
| CHANG HYUN-JU | 1 | 2013 |
| CHOI YOUNG-MIN | 1 | 2013 |
| JUNG HA-KYUN | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Daejeon, KR | 10 | 1999–2020 |