Inventor
Robert J. Markunas
Inventor
Chapel Hill, NC, US
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material22%
C30BSingle-crystal growth11%
H01JElectric discharge tubes or discharge lamps11%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems7%
H10DInorganic electric semiconductor devices7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
H05BElectric heating4%
H05HPlasma technique4%
PatentTitleYear
7,622,324'Wafer bonding hermetic encapsulation'20097,112,536'Plasma processing system and method'20066,822,326'Wafer bonding hermetic encapsulation'20046,558,504'Plasma processing system and method'20036,552,295'Plasma furnace disposal of hazardous wastes'20035,908,565'Line plasma vapor phase deposition apparatus and method'19995,585,292'Method of fabricating a thin film transistor'19965,521,360'Apparatus and method for microwave processing of materials'19965,480,686'Process and apparatus for chemical vapor deposition of diamond films using water-based plasma discharges'19965,418,018'Chemical vapor deposition of diamond films using water-based plasma discharges'19955,180,435'Remote plasma enhanced CVD method and apparatus for growing an epitaxial semiconductor layer'19935,168,330'Semiconductor device having a semiconductor substrate interfaced to a dissimilar material by means of a single crystal pseudomorphic interlayer'19925,018,479'Remote plasma enhanced CVD method and apparatus for growing an epitaxial semconductor layer'19914,870,030'Remote plasma enhanced CVD method for growing an epitaxial semiconductor layer'1989H0000667'Patterned tunnel junction'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–1993Patents assigned to RES TRIANGLE INST INC (2)· patent assignee history
1989–2009Based in Chapel Hill, NC, US· patent location history
1991Patents assigned to RESERACH TRIANGLE INST INC (1)· patent assignee history
1992–2006Patents assigned to RES TRIANGLE INST (8)· patent assignee history
1996Patents assigned to MARTIN MARIETTA ENERGY SYSTEMS (1)· patent assignee history
2004–2009Patents assigned to ZIPTRONIX (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| RES TRIANGLE INST | 8 | 1992–2006 |
| RES TRIANGLE INST INC | 2 | 1989–1993 |
| ZIPTRONIX | 2 | 2004–2009 |
| MARTIN MARIETTA ENERGY SYSTEMS | 1 | 1996 |
| RESERACH TRIANGLE INST INC | 1 | 1991 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chapel Hill, NC, US | 15 | 1989–2009 |