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Inventor

Ian M. Croll

Inventor
Pleasantville, NY, US

Overview

2→
Patents
1981–1982
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests25%
G11BInformation storage based on relative movement between record carrier and transducer13%
H05KPrinted circuits13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
PatentTitleYear
4,315,985'Fine-line circuit fabrication and photoresist application therefor'19824,281,057'Variable pre-spin drying time control of photoresists thickness'1981

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1981–1982Patents assigned to IBM (2)· patent assignee history
1981–1982Based in Pleasantville, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM21981–1982
Locations
LocationPatentsSpan
Pleasantville, New York, US21981–1982