Inventor
Tadashi Aoto
Inventor
Miyagi, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1035%
H01JElectric discharge tubes or discharge lamps30%
H01LSemiconductor devices20%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling5%
B24BMachines, devices, or processes for grinding or polishing5%
C23CCoating metallic material5%
PatentTitleYear
10,153,138Plasma etching apparatus20189,589,823'Mounting table and plasma processing apparatus'20179,412,635'Electrostatic chuck device'20169,214,376'Substrate mounting stage and surface treatment method therefor'20158,343,372'Surface processing method for mounting stage'20137,815,492'Surface treatment method'20107,481,903'Processing device and method of maintaining the device, mechanism and method for assembling processing device parts, and lock mechanism and method for locking the lock mechanism'20096,899,786'Processing device and method of maintaining the device, mechanism and method for assembling processing device part, and lock mechanism and method for locking the lock mechanism'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2018Patents assigned to TOKYO ELECTRON LTD (8)· patent assignee history
2005–2018Based in Miyagi, JP· patent location history
2010–2015Based in Nirasaki, JP· patent location history
2013–2015Patents assigned to AOTO TADASHI (2)· patent assignee history
2013–2015Patents assigned to HIGUMA MASAKAZU (2)· patent assignee history
2013–2015Patents assigned to KIKUCHI EIICHIRO (2)· patent assignee history
2013Patents assigned to HIGUCHI KIMIHIRO (1)· patent assignee history
2013Based in Miyagi-gun, JP· patent location history
2016Based in Kurokawa-gun, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 8 | 2005–2018 |
| AOTO TADASHIself | 2 | 2013–2015 |
| HIGUMA MASAKAZU | 2 | 2013–2015 |
| KIKUCHI EIICHIRO | 2 | 2013–2015 |
| HIGUCHI KIMIHIRO | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Miyagi, JP | 4 | 2005–2018 |
| Nirasaki, JP | 2 | 2010–2015 |
| Kurokawa-gun, JP | 1 | 2016 |
| Miyagi-gun, JP | 1 | 2013 |