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Inventor

Masaji Sakamura

Inventor
Tokyo, JP

Overview

4→
Patents
1998–2012
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material22%
H10BElectronic memory devices22%
H10DInorganic electric semiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
Y02CCapture, storage, sequestration or disposal of greenhouse gases [ghg]11%
Y02PClimate change mitigation technologies in the production or processing of goods11%
PatentTitleYear
8,277,560'CVD apparatus and method of cleaning the CVD apparatus'20128,043,438'Device for cleaning CVD device and method of cleaning CVD device'20116,274,489'Manufacturing method of semiconductor apparatus'20015,792,695'Manufacturing method of a semiconductor eprom device'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2012Patents assigned to SANYO ELECTRIC CO (4)· patent assignee history
1998–2001Based in Tatebayashi, JP· patent location history
2011–2012Patents assigned to CANON ANELVA CORP (2)· patent assignee history
2011–2012Patents assigned to HITACHI INT ELECTRIC INC (2)· patent assignee history
2011–2012Patents assigned to NAT INST OF ADVANCED IND SCIEN (2)· patent assignee history
2011–2012Patents assigned to RENESAS ELECTRONICS CORP (2)· patent assignee history
2011–2012Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SANYO ELECTRIC CO41998–2012
CANON ANELVA CORP22011–2012
HITACHI INT ELECTRIC INC22011–2012
NAT INST OF ADVANCED IND SCIEN22011–2012
RENESAS ELECTRONICS CORP22011–2012
Locations
LocationPatentsSpan
Tokyo, JP22011–2012
Tatebayashi, JP21998–2001