Inventor

Yue-Hao Huang

Inventor

Hsinchu, TW

Overview

2008

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Jprimary

B01JChemical or physical processes, e.g. catalysis or colloid chemistry14%

B01LChemical or physical laboratory apparatus for general use14%

B82YSpecific uses or applications of nanostructures14%

D01FChemical features in the manufacture of artificial filaments, threads, fibres, bristles or ribbons14%

G01NInvestigating or analysing materials by determining their chemical or physical properties14%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%

Y10TTechnical subjects covered by former us classification14%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2008Patents assigned to IND TECH RES INST (2)· patent assignee history

2008Based in Hsinchu, TW· patent location history

2008Based in Kaohsiung, TW· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
IND TECH RES INST	2	2008

Locations

Location	Patents	Span
Hsinchu, TW	1	2008
Kaohsiung, TW	1	2008