Inventor

Shih-Hung Tsai

Inventor

Tainan, TW

Overview

2012–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 73 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary

H10DInorganic electric semiconductor devices37%

H01LSemiconductor devices31%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%

H10BElectronic memory devices2%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices1%

G06FElectric digital data processing1%

PatentTitleYear

10,868,148Rinse process after forming fin-shaped structure2020 10,707,135Method for fabricating semiconductor device2020 10,692,777Semiconductor device2020 10,643,997Semiconductor device with metal gates2020 10,629,695Semiconductor device and method for fabricating the same2020 10,497,810Method for fabricating semiconductor device2019 10,431,497Manufacturing method of epitaxial fin-shaped structure2019 10,263,095Method of forming semiconductor fin structure2019 10,236,383Method for fabricating semiconductor device2019 10,211,313Semiconductor device and method for fabricating the same2019 10,121,881Semiconductor device and method for fabricating the same2018 10,068,808Semiconductor device and method for fabricating the same2018 10,062,770Complementary metal oxide semiconductor field effect transistor, metal oxide semiconductor field effect transistor and manufacturing method thereof2018 10,056,467Semiconductor fin structure and method of forming the same2018 10,032,672Method of fabricating a semiconductor device having contact structures2018 9,947,792Semiconductor device and method for fabricating the same2018 9,859,148'Semiconductor device and method for fabricating the same'2018 9,847,402Method of using polysilicon as stop layer in a replacement metal gate process2017 9,842,760'Method for fabricating semiconductor device'2017 9,831,133Semiconductor devices having metal gate and method for manufacturing semiconductor devices having metal gate2017 9,786,662'Semiconductor device and method for fabricating the same'2017 9,761,692'Method of using polysilicon as stop layer in a replacement metal gate process'2017 9,755,056'Method for forming semiconductor device'2017 9,754,938'Semiconductor device and method of fabricating the same'2017 9,704,737'Semiconductor device and method for fabricating the same'2017 9,653,603'Semiconductor device and method for fabricating the same'2017 9,653,290'Method for manufacturing nanowire transistor device'2017 9,627,268'Method for fabricating semiconductor device'2017 9,583,568'Semiconductor structure and manufacturing method thereof'2017 9,583,394'Manufacturing method of semiconductor structure'2017 9,559,164'Nanowire transistor device and method for manufacturing nanowire transistor device'2017 9,552,978'Method of decreasing fin bending'2017 9,553,026'Semiconductor device and method for fabricating the same'2017 9,536,792'Complementary metal oxide semiconductor field effect transistor, metal oxide semiconductor field effect transistor and manufacturing method thereof'2017 9,530,646'Method of forming a semiconductor structure'2016 9,530,778'Semiconductor devices having metal gate and method for manufacturing semiconductor devices having metal gate'2016 9,508,715'Semiconductor structure'2016 9,502,410'Semiconductor structure and manufacturing method thereof'2016 9,502,252'Semiconductor device and method for fabricating the same'2016 9,484,263'Method of removing a hard mask on a gate'2016 9,455,194'Method for fabricating semiconductor device'2016 9,384,978'Method of forming trenches'2016 9,349,653'Manufacturing method of semiconductor structure for preventing surface of fin structure from damage and providing improved process window'2016 9,349,833'Semiconductor device and method of forming the same'2016 9,318,334'Method for fabricating semiconductor device'2016 9,312,365'Manufacturing method of non-planar FET'2016 9,281,209'Method for fabricating semiconductor device'2016 9,268,896'Method of forming a photomask'2016 9,269,791'Multi-gate MOSFET with embedded isolation structures'2016 9,142,641'Method for manufacturing finFET'2015 9,123,659'Method for manufacturing finFET device'2015 9,105,685'Method of forming shallow trench isolation structure'2015 9,076,870'Method for forming fin-shaped structure'2015 9,054,187'Semiconductor structure'2015 9,024,393'Manufacturing method for semiconductor device having metal gate'2015 9,006,091'Method of forming semiconductor device having metal gate'2015 8,987,096'Semiconductor process'2015 8,877,623'Method of forming semiconductor device'2014 8,872,280'Non-planar FET and manufacturing method thereof'2014 8,853,013'Method for fabricating field effect transistor with fin structure'2014 8,841,197'Method for forming fin-shaped structures'2014 8,779,513'Non-planar semiconductor structure'2014 8,722,501'Method for manufacturing multi-gate transistor device'2014 8,691,651'Method of forming non-planar FET'2014 8,669,618'Manufacturing method for semiconductor device having metal gate'2014 8,664,060'Semiconductor structure and method of fabricating the same'2014 8,642,457'Method of fabricating semiconductor device'2014 8,592,271'Metal-gate CMOS device and fabrication method thereof'2013 8,470,714'Method of forming fin structures in integrated circuits'2013 8,466,502'Metal-gate CMOS device'2013 8,441,072'Non-planar semiconductor structure and fabrication method thereof'2013 8,426,277'Semiconductor process'2013 8,278,184'Fabrication method of a non-planar transistor'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2020Patents assigned to UNITED MICROELECTRONICS CORP (73)· patent assignee history

2012–2016Patents assigned to TSAI SHIH-HUNG (15)· patent assignee history

2012–2015Patents assigned to LIN CHIEN-TING (11)· patent assignee history

2012–2016Patents assigned to FU SSU-I (10)· patent assignee history

2012–2016Patents assigned to CHEN YING-TSUNG (9)· patent assignee history

2012–2020Based in Tainan, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
UNITED MICROELECTRONICS CORP	73	2012–2020
TSAI SHIH-HUNGself	15	2012–2016
LIN CHIEN-TING	11	2012–2015
FU SSU-I	10	2012–2016
CHEN YING-TSUNG	9	2012–2016

Locations

Location	Patents	Span
Tainan, TW	73	2012–2020