Inventor

MITSUNOBU MORITA

Inventor
JP

Overview

7→
Patents
2021–2024
Patent span
Chemistry
Primary field (CPC C)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Dprimary
C09DCoating compositions, e.g. paints, varnishes or lacquers20%
A45DHairdressing or shaving equipment10%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering10%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds10%
A61KPreparations for medical, dental or toiletry purposes7%
A61QSpecific use of cosmetics or similar toiletry preparations7%
B29CShaping or joining of plastics7%
B41MPrinting, duplicating, marking, or copying processes7%
C08LCompositions of macromolecular compounds7%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2024Patents assigned to RICOH CO LTD (7)· patent assignee history
2021–2024Based in JP· patent location history
2024Patents assigned to KOBAYASHI MASAHIDE (1)· patent assignee history
2024Patents assigned to MORITA MITSUNOBU (1)· patent assignee history
2024Patents assigned to NOGUCHI SOH (1)· patent assignee history
2024Patents assigned to OKADA TAKASHI (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
RICOH CO LTD72021–2024
KOBAYASHI MASAHIDE12024
MORITA MITSUNOBUself12024
NOGUCHI SOH12024
OKADA TAKASHI12024
Locations
LocationPatentsSpan
JP72021–2024