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Inventor

Toshiaki Kurosu

Inventor
Oita, JP

Overview

21→
Patents
2012–2021
Patent span
Performing operations
Primary field (CPC B)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B41Jprimary
B41JTypewriters45%
Y10TTechnical subjects covered by former us classification17%
B29CShaping or joining of plastics10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
A61MDevices for introducing media into, or onto, the body5%
B44CProducing decorative effects5%
B81BMicrostructural devices or systems, e.g. micromechanical devices5%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems5%
B29LIndexing scheme associated with subclass b29c, relating to particular articles2%
PatentTitleYear
10,981,392Liquid ejection head and method of manufacturing liquid ejection head20219,604,454'Method for manufacturing liquid ejection head'20179,266,330'Process for producing a semiconductor chip'20169,238,384'Method of manufacturing microneedle'20169,162,459'Liquid ejection head'20159,146,461'Method of making nozzle chip'20159,132,647'Liquid ejection head and fabricating method therefor'20159,102,149'Liquid ejection head'20159,079,405'Liquid ejection head and method for manufacturing the same'20159,039,143'Ink jet recording head and method for manufacturing the same'20159,023,593'Method of manufacturing liquid ejection head'20158,991,051'Manufacturing method of liquid discharge head'20158,888,245'Liquid ejection head having protected orifice plate and method for manufacturing liquid ejection head'20148,580,483'Method of making nozzle chip'20138,544,997'Liquid ejection head and manufacturing method thereof'20138,434,850'Liquid discharge head and manufacturing method of the same'20138,388,099'Ink jet recording head'20138,388,106'Ink discharge head and manufacturing method thereof'20138,377,364'Method of manufacturing microneedle'20138,286,351'Manufacturing method of liquid discharge head'20128,256,878'Substrate for ink ejection heads, ink ejection head, method of manufacturing substrate, and method of manufacturing ink ejection head'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2021Patents assigned to CANON KK (19)· patent assignee history
2012–2013Patents assigned to KUROSU TOSHIAKI (7)· patent assignee history
2012–2013Patents assigned to IBE SATOSHI (5)· patent assignee history
2012–2013Patents assigned to TAGAWA YOSHINORI (5)· patent assignee history
2012–2013Patents assigned to ASAI KAZUHIRO (3)· patent assignee history
2012–2015Based in Kawasaki, JP· patent location history
2013–2016Based in Tokyo, JP· patent location history
2014–2017Based in Oita, JP· patent location history
2021Based in Kamakura, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK192012–2021
KUROSU TOSHIAKIself72012–2013
IBE SATOSHI52012–2013
TAGAWA YOSHINORI52012–2013
ASAI KAZUHIRO32012–2013
Locations
LocationPatentsSpan
Oita, JP102014–2017
Kawasaki, JP82012–2015
Tokyo, JP22013–2016
Kamakura, JP12021