Inventor

TAKASHI SAKUMA

Inventor
JP

Overview

11→
Patents
2022–2025
Patent span
Chemistry
Primary field (CPC C)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Jprimary
B01JChemical or physical processes, e.g. catalysis or colloid chemistry14%
G21FProtection against x-radiation, gamma radiation, corpuscular radiation or particle bombardment14%
C02FTreatment of water, waste water, sewage, or sludge12%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
H01LSemiconductor devices7%
C01BNon-metallic elements5%
C01GCompounds containing metals not covered by subclasses c01d or c01f5%
B28BShaping clay or other ceramic compositions2%
C01FCompounds of the metals beryllium, magnesium, aluminium, calcium, strontium, barium, radium, thorium, or of the rare-earth metals2%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022Patents assigned to EBARA CORP (4)· patent assignee history
2022–2024Patents assigned to TITAN KOGYO KK (3)· patent assignee history
2022Patents assigned to NIPPON CHEMICAL IND (2)· patent assignee history
2022Patents assigned to OMRON TATEISI ELECTRONICS CO (1)· patent assignee history
2022–2025Based in JP· patent location history
2023–2025Patents assigned to TOKYO ELECTRON LTD (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP42022
TOKYO ELECTRON LTD42023–2025
TITAN KOGYO KK32022–2024
NIPPON CHEMICAL IND22022
OMRON TATEISI ELECTRONICS CO12022
Locations
LocationPatentsSpan
JP112022–2025