Inventor
Ralf B uscher
Inventor
Lohmar, DE
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Cprimary
G03CPhotosensitive materials for photographic purposes50%
C07CAcyclic or carbocyclic compounds25%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds25%
Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996Patents assigned to AGFA GEVAERT NV (1)· patent assignee history
1996–1997Based in Lohmar, DE· patent location history
1997Patents assigned to AGFA GEVAERT AG (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AGFA GEVAERT AG | 1 | 1997 |
| AGFA GEVAERT NV | 1 | 1996 |
Locations
| Location | Patents | Span |
|---|---|---|
| Lohmar, DE | 2 | 1996–1997 |