Inventor
J. Thomas Kocab
Inventor
Exeter, RI, US
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B82Yprimary
B82YSpecific uses or applications of nanostructures11%
H01LSemiconductor devices9%
H10KOrganic electric solid-state devices9%
Y10TTechnical subjects covered by former us classification9%
G11CStatic stores8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
C01BNon-metallic elements6%
H10BElectronic memory devices4%
H10NElectric solid-state devices not otherwise provided for4%
C09DCoating compositions, e.g. paints, varnishes or lacquers3%
PatentTitleYear
11,072,714Nanotube solution treated with molecular additive, nanotube film having enhanced adhesion property, and methods for forming the nanotube solution and the nanotube film202110,773,960Low porosity nanotube fabric articles202010,654,718Scalable nanotube fabrics and methods for making same202010,181,569Two-terminal switching devices comprising coated nanotube elements201910,069,072Nanotube solutions with high concentration and low contamination and methods for purifiying nanotube solutions20189,755,170'Resistive materials comprising mixed nanoscopic particles and carbon nanotubes'20179,650,732'Low defect nanotube application solutions and fabrics and methods for making same'20179,634,251'Nanotube solution treated with molecular additive, nanotube film having enhanced adhesion property, and methods for forming the nanotube solution and the nanotube film'20179,617,151'Methods for controlling density, porosity, and/or gap size within nanotube fabric layers and films'20179,337,423'Two-terminal switching device using a composite material of nanoscopic particles and carbon nanotubes'20168,969,142'Switching materials comprising mixed nanoscopic particles and carbon nanotubes and methods of making and using the same'20157,416,821'Thermally cured undercoat for lithographic application'20086,911,297'Photoresist compositions'20056,855,476'Photoacid generators for use in photoresist compositions'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005Based in Wyoming, RI, US· patent location history
2008Based in Piermont, NH, US· patent location history
2015–2021Patents assigned to NANTERO INC (11)· patent assignee history
2015–2021Based in Exeter, RI, US· patent location history
2016Based in Exeler, RI, US· patent location history
2017–2020Patents assigned to KOCAB J THOMAS (4)· patent assignee history
2017–2020Patents assigned to SEN RAHUL (4)· patent assignee history
2017–2018Patents assigned to GU FENG (3)· patent assignee history
2017–2020Patents assigned to ROBERTS DAVID A (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NANTERO INC | 11 | 2015–2021 |
| KOCAB J THOMASself | 4 | 2017–2020 |
| SEN RAHUL | 4 | 2017–2020 |
| GU FENG | 3 | 2017–2018 |
| ROBERTS DAVID A | 3 | 2017–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Exeter, RI, US | 10 | 2015–2021 |
| Wyoming, RI, US | 2 | 2005 |
| Exeler, RI, US | 1 | 2016 |
| Piermont, NH, US | 1 | 2008 |