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Inventor

Alan Lek

Inventor
Singapore, SG

Overview

2→
Patents
2006–2011
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices67%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
7,932,152'Method of forming a gate stack structure'20117,022,625'Method of fabricating a gate dielectric layer with reduced gate tunnelling current and reduced boron penetration'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2011Patents assigned to CHARTERED SEMICONDUCTOR MFG (2)· patent assignee history
2006–2011Based in Singapore, SG· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CHARTERED SEMICONDUCTOR MFG22006–2011
Locations
LocationPatentsSpan
Singapore, SG22006–2011