Inventor
TAKUHIRO TANIGUCHI
Inventor
JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
C07CAcyclic or carbocyclic compounds17%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds17%
C07DHeterocyclic compounds13%
C09DCoating compositions, e.g. paints, varnishes or lacquers9%
C07JSteroids4%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds4%
C08LCompositions of macromolecular compounds4%
C09KMaterials for miscellaneous applications, not provided for elsewhere4%
C25DProcesses for the electrolytic or electrophoretic production of coatings4%
PatentTitleYear
12,158,700Photosensitive resin composition, method for forming resist pattern, method for manufacturing plated molded article, and semiconductor apparatus202412,092,957Radiation-sensitive resin composition, method for forming resist pattern and compound202411,966,161Radiation-sensitive resin composition, method of forming resist pattern, and compound202411,609,495Radiation-sensitive resin composition and resist pattern-forming method202311,592,746Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid2023Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2023–2024Patents assigned to JSR CORP (5)· patent assignee history
2023–2024Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JSR CORP | 5 | 2023–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 5 | 2023–2024 |