Inventor
Paul M. Schaible
Inventor
Poughkeepsie, NY, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Kprimary
H05KPrinted circuits21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1021%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests21%
C23FNon-mechanical removal of metallic material from surface7%
Y10TTechnical subjects covered by former us classification7%
PatentTitleYear
4,944,836'Chem-mech polishing method for producing coplanar metal/insulator films on a substrate'19904,430,365'Method for forming conductive lines and vias'19844,396,458'Method for forming planar metal/insulator structures'19834,352,716'Dry etching of copper patterns'19824,132,586'Selective dry etching of substrates'19793,994,793'Reactive ion etching of aluminum'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–1990Patents assigned to IBM (6)· patent assignee history
1976–1990Based in Poughkeepsie, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 6 | 1976–1990 |
Locations
| Location | Patents | Span |
|---|---|---|
| Poughkeepsie, New York, US | 6 | 1976–1990 |