Inventor
Dengfeng Xu
Inventor
Beijing, CN
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
G01BMeasuring length, thickness or similar linear dimensions13%
G01DMeasuring not specially adapted for a specific variable10%
C04BLime, magnesia8%
Y10TTechnical subjects covered by former us classification8%
C03BManufacture, shaping, or supplementary processes6%
C03CChemical composition of glasses, glazes or vitreous enamels6%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry5%
B01DSeparation3%
G05BControl or regulating systems in general3%
PatentTitleYear
10,532,832Magnetic levitation reaction sphere202010,238,771Methods for treating bioprosthetic tissue using a nucleophile/electrophile in a catalytic system20199,995,569Six-degree-of-freedom displacement measurement method for exposure region on silicon wafer stage20189,903,704'Three-DOF heterodyne grating interferometer displacement measurement system'20189,885,556'Dual-frequency grating interferometer displacement measurement system'20189,879,979'Heterodyne grating interferometer displacement measurement system'20189,869,857'Optical grating phase modulator for laser interference photoetching system'20189,766,054'Planar motor rotor displacement measuring device and its measuring method'20179,752,643'Negative stiffness system for gravity compensation of micropositioner'20179,547,245'Dual wafer stage switching system for a lithography machine'20179,455,650'Two-dimensional locating method of motion platform based on magnetic steel array'20169,310,797'Single degree of freedom vibration isolating device of linear motor and motion control method thereof'20169,310,782'Method for measuring displacement of planar motor rotor'20169,182,217'Method for measuring displacement of large-range moving platform'20159,030,648'Dual wafer stage exchanging system for lithographic device'20158,958,078'Two-dimensional, position-sensitive sensor-based system for positioning object having six degrees of freedom in space'20158,860,927'Dual-stage exchange system for lithographic apparatus'20148,836,918'Dual-stage exchange system for lithographic apparatus'20148,284,380'Dual-stage switching system for lithographic machine'20128,084,897'Micro stage with 6 degrees of freedom'20117,651,762'Methods and devices using a shrinkable support for porous monolithic materials'20107,595,350'Ultraporous sol gel monoliths'20097,439,272'Ultraporous sol gel monoliths'20087,125,912'Doped sol-gel materials and method of manufacture utilizing reduced mixing temperatures'20067,026,362'Sol-gel process utilizing reduced mixing temperatures'20067,000,885'Apparatus and method for forming a sol-gel monolith utilizing multiple casting'20066,884,822'Sol-gel process utilizing reduced mixing temperatures'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2019Based in Irvine, CA, US· patent location history
2011–2020Patents assigned to UNIV TSINGHUA (19)· patent assignee history
2011–2017Patents assigned to XU DENGFENG (8)· patent assignee history
2011–2017Patents assigned to ZHANG MING (8)· patent assignee history
2011–2017Patents assigned to ZHU YU (8)· patent assignee history
2011–2016Patents assigned to YIN WENSHENG (7)· patent assignee history
2011–2020Based in Beijing, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNIV TSINGHUA | 19 | 2011–2020 |
| XU DENGFENGself | 8 | 2011–2017 |
| ZHANG MING | 8 | 2011–2017 |
| ZHU YU | 8 | 2011–2017 |
| YIN WENSHENG | 7 | 2011–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Beijing, CN | 19 | 2011–2020 |
| Irvine, California, US | 8 | 2005–2019 |