Inventor
Hiromitsu Nakashima
Inventor
Tokyo, JP
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices35%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
C08LCompositions of macromolecular compounds9%
H01LSemiconductor devices4%
C07CAcyclic or carbocyclic compounds3%
C07DHeterocyclic compounds3%
C09DCoating compositions, e.g. paints, varnishes or lacquers1%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests1%
PatentTitleYear
11,130,856Resin composition and method of forming resist pattern202110,620,534Fluorine-containing polymer, purification method, and radiation-sensitive resin composition202010,564,546Resist pattern-forming method202010,082,733Fluorine-containing polymer, purification method, and radiation-sensitive resin composition201810,048,586Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound20189,598,520'Radiation-sensitive resin composition, polymer and method for forming a resist pattern'20179,513,548'Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound'20169,500,950'Fluorine-containing polymer, purification method, and radiation-sensitive resin composition'20169,268,219'Photoresist composition and resist pattern-forming method'20169,213,236'Fluorine-containing polymer, purification method, and radiation-sensitive resin composition'20159,158,196'Radiation-sensitive resin composition and pattern-forming method'20159,116,427'Composition for forming resist underlayer film and pattern-forming method'20159,046,765'Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film'20158,895,229'Composition for formation of upper layer film, and method for formation of photoresist pattern'20148,895,223'Radiation-sensitive resin composition'20148,728,706'Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound'20148,697,343'Fluorine-containing polymer, purification method, and radiation-sensitive resin composition'20148,609,319'Radiation-sensitive resin composition and resist film formed using the same'20138,609,318'Radiation-sensitive resin composition, method for forming resist pattern and polymer'20138,609,321'Radiation-sensitive resin composition, polymer and compound'20138,597,867'Lactone copolymer and radiation-sensitive resin composition'20138,507,189'Upper layer film forming composition and method of forming photoresist pattern'20138,435,718'Upper layer-forming composition and photoresist patterning method'20138,273,521'Radiation-sensitive resin composition and compound'20128,182,977'Polymer and positive-tone radiation-sensitive resin composition'20128,076,053'Upper layer-forming composition and photoresist patterning method'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2021Patents assigned to JSR CORP (26)· patent assignee history
2011–2017Patents assigned to NAKASHIMA HIROMITSU (13)· patent assignee history
2011–2017Patents assigned to NISHIMURA YUKIO (6)· patent assignee history
2011–2014Patents assigned to KOUNO DAITA (4)· patent assignee history
2011–2021Based in Tokyo, JP· patent location history
2012–2014Patents assigned to NAKAHARA KAZUO (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JSR CORP | 26 | 2011–2021 |
| NAKASHIMA HIROMITSUself | 13 | 2011–2017 |
| NISHIMURA YUKIO | 6 | 2011–2017 |
| KOUNO DAITA | 4 | 2011–2014 |
| NAKAHARA KAZUO | 4 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 26 | 2011–2021 |