Inventor

Takafumi Niwa

Inventor

Koshi, JP

Overview

1998–2020

Patent span

Electricity

Primary field (CPC H)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%

H01LSemiconductor devices20%

B05CApparatus for applying fluent materials to surfaces, in general8%

B29CShaping or joining of plastics4%

G11BInformation storage based on relative movement between record carrier and transducer4%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%

Y10TTechnical subjects covered by former us classification4%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1998Based in Atsugi, JP· patent location history

2012–2020Patents assigned to TOKYO ELECTRON LTD (7)· patent assignee history

2012–2013Patents assigned to NAKAMURA HIROSHI (2)· patent assignee history

2012–2013Patents assigned to NIWA TAKAFUMI (2)· patent assignee history

2012Patents assigned to KYOUDA HIDEHARU (1)· patent assignee history

2012–2020Based in Koshi, JP· patent location history

2013Patents assigned to KUWAHARA YUHEI (1)· patent assignee history

2013Based in Kumamoto, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations