Inventor
Seiji Matsuura
Inventor
Tokyo, JP
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
B23BTurning6%
B23PMetal-working not otherwise provided for6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds6%
C08JWorking-up6%
C08LCompositions of macromolecular compounds6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
Y10TTechnical subjects covered by former us classification6%
G01MTesting static or dynamic balance of machines or structures3%
PatentTitleYear
10,281,821Exposure apparatus, exposure method, and device manufacturing method20197,572,558'Photomask and exposure method'20097,537,864'Hole pattern design method and photomask'20097,295,286'Exposure device and method of exposure'20076,335,125'Photomask and method of manufacturing same'20026,310,684'Method of measuring spherical aberration in projection system'20016,271,919'Semiconductor device and alignment apparatus and alignment method for same'20016,208,469'Method of adjusting reduction projection exposure device'20016,200,076'Cutting tool and method for producing the same'20016,160,623'Method for measuring an aberration of a projection optical system'20006,084,678'Method of alignment between mask pattern and wafer pattern'20006,058,807'Cutting tool and method for producing the same'20006,037,411'Acoustic vibrational material of fiber reinforcement with epoxy resin and epoxy-reactive polybutadiene'20006,013,395'Photomask for use in exposure and method for producing same'20005,663,220'Acoustic vibrational material from fiber-reinforced polybutadiene-modified epoxy resin'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2000Patents assigned to SONY CORP (2)· patent assignee history
1997–2000Based in Chiba, JP· patent location history
2000–2002Patents assigned to NEC CORP (7)· patent assignee history
2000–2001Patents assigned to MITSUBISHI MATERIALS CORP (2)· patent assignee history
2000Patents assigned to MITSUI PETROCHEMICAL IND (1)· patent assignee history
2000–2002Based in Tokyo, JP· patent location history
2000–2019Based in Ibaraki, JP· patent location history
2007–2009Patents assigned to NEC ELECTRONICS CORP (3)· patent assignee history
2007–2009Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NEC CORP | 7 | 2000–2002 |
| NEC ELECTRONICS CORP | 3 | 2007–2009 |
| MITSUBISHI MATERIALS CORP | 2 | 2000–2001 |
| SONY CORP | 2 | 1997–2000 |
| MITSUI PETROCHEMICAL IND | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 7 | 2000–2002 |
| Ibaraki, JP | 3 | 2000–2019 |
| Kanagawa, JP | 3 | 2007–2009 |
| Chiba, JP | 2 | 1997–2000 |