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Inventor

Jan Hoegee

Inventor
Eindhoven, NL

Overview

3→
Patents
2003–2005
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests25%
PatentTitleYear
6,958,806'Lithographic apparatus and device manufacturing method'20056,733,165'Optical integrator for an illumination device'20046,583,855'Lithographic apparatus, device manufacturing method, and device manufactured thereby'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2005Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2003–2004Based in Eindhoven, NL· patent location history
2004Patents assigned to ZEISS CARL SEMICONDUCTOR MFG (1)· patent assignee history
2005Based in Delft, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22003–2005
ZEISS CARL SEMICONDUCTOR MFG12004
Locations
LocationPatentsSpan
Eindhoven, NL22003–2004
Delft, NL12005