Inventor
Kenichi Kawashima
Inventor
Hitachinaka, JP
Overview
Patents· 38 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
F04Cprimary
F04CRotary-piston, or oscillating-piston, positive-displacement machines for liquids9%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
H01JElectric discharge tubes or discharge lamps9%
F04BPositive-displacement machines for liquids7%
H01RElectrically-conductive connections7%
B82YSpecific uses or applications of nanostructures6%
F01CRotary-piston or oscillating-piston machines or engines6%
B05DProcesses for applying fluent materials to surfaces, in general4%
B41CProcesses for the manufacture or reproduction of printing surfaces4%
F02BInternal-combustion piston engines4%
PatentTitleYear
10,862,236Connector202010,421,340Vehicle sun visor201910,050,376Connector201810,008,806Lever-type connector capable of operability20189,698,526'Connector with aligning plate'20179,496,646'Posture holding lever type connector'20166,543,360'Printing plate and printer using it'20036,443,375'Fuel injection valve coated with anti-fouling perfluoropolyether film layer and associated method, and direct injection engine using same'20026,431,473'Fuel injection valve coated with anti-fouling perfluoropolyether film layer and associated method, and direct injection engine using same'20026,273,348'Fuel injection valve and direct injection engine using the same'20016,176,094'Refrigerating machine oil composition, and refrigeration and compressor using the refrigerating machine oil composition'20016,087,072'Article having a light-controllable super-water-repellent surface and a printing machine using the article'20006,086,454'Method of fabricating a semiconductor device using a CMP process'20006,027,852'Article having a light-controllable super-water-repellent surface and a printing machine using the article'20005,338,647'Reflection type photomask and reflection type photolithography method comprising a concavo-convex surface'19945,276,334'Charged particle beam exposure method and apparatus'19945,260,579'Charged particle beam exposure system and charged particle beam exposure method'19935,204,950'Data processing system for transmitting data between a host processor and an I/O device'19935,190,836'Reflection type photomask with phase shifter'19934,867,649'Refrigerating system'19894,861,245'Scroll compressor with sealed pressure space biasing the orbiting scroll member'19894,853,870'Electron beam exposure system'19894,815,943'Variable displacement wobble plate compressor with capacity control valve'19894,782,712'Variable displacement compressor'19884,702,684'Slide vane type compressor with increased suction part-cross-sectional area'19874,653,991'Vane type compressor with fluid pressure biased vanes'19874,636,148'Vane type compressor with volume control'19874,564,764'Wafer having chips for determining the position of the wafer by means of electron beams'19864,515,514'Vane-type rotary machine'19854,508,968'Apparatus for processing negative photoresist'19854,425,765'Air conditioner for automobiles'19844,426,439'Method and apparatus for processing negative photoresist'19844,326,838'Swash plate type compressor for use in air-conditioning system for vehicles'19824,322,626'Method of electron beam exposure'19824,321,019'Swash plate type compressor'19824,291,231'Electron beam exposure system and an apparatus for carrying out the same'19814,202,182'Multi-tube evaporator for a cooler used in an automobile'19803,989,426'Vane pump'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–2003Patents assigned to HITACHI LTD (20)· patent assignee history
1976–1982Based in Hitachi, JP· patent location history
1981–2000Patents assigned to FUJITSU LTD (11)· patent assignee history
1981–1994Based in Yokohama, JP· patent location history
1984–1989Based in Sagamihara, JP· patent location history
1988–1989Based in Katsuta, JP· patent location history
1993Patents assigned to IBM (1)· patent assignee history
2000–2003Based in Hitachinaka, JP· patent location history
2003Patents assigned to HITACHI KOKI KK (1)· patent assignee history
2016–2020Patents assigned to YAZAKI CORP (6)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 20 | 1976–2003 |
| FUJITSU LTD | 11 | 1981–2000 |
| YAZAKI CORP | 6 | 2016–2020 |
| HITACHI KOKI KK | 1 | 2003 |
| IBM | 1 | 1993 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hitachinaka, JP | 7 | 2000–2003 |
| Yokohama, JP | 4 | 1981–1994 |
| Katsuta, JP | 4 | 1988–1989 |
| Sagamihara, JP | 4 | 1984–1989 |
| Hitachi, JP | 4 | 1976–1982 |