Inventor
Ryuji Hasemi
Inventor
Niigata, JP
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
Y10Sprimary
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
C07CAcyclic or carbocyclic compounds11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%
B01DSeparation5%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry5%
C07BGeneral methods of organic chemistry5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
PatentTitleYear
10,975,191Urethane (meth)acrylate, method for manufacturing urethane (meth)acrylate, curable composition, cured article, and method for manufacturing cured article202110,294,319Triacrylate compounds and methods for producing the same, and compositions20198,835,595'Polyamide compound'20147,470,525'Process for producing optically active 2-alkycysteine, derivative thereof, and processes for production'20087,208,631'2-alkylcysteinamide or salt thereof, process for producing these, and use of these'20076,447,576'Cleaning agent and cleaning process of harmful gas'20026,325,841'Purifying agent and purification method for halogen-containing exhaust gas'20015,972,862'Cleaning liquid for semiconductor devices'19995,962,385'Cleaning liquid for semiconductor devices'19995,911,836'Method of producing semiconductor device and rinse for cleaning semiconductor device'19995,567,574'Removing agent composition for photoresist and method of removing'19965,436,364'Process for producing dimethyl 2,6-naphthalene-dicarboxylate'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2021Patents assigned to MITSUBISHI GAS CHEMICAL CO (10)· patent assignee history
1995–2021Based in Niigata, JP· patent location history
2001–2002Patents assigned to JAPAN PIONICS (2)· patent assignee history
2001–2002Based in Kanagawa, JP· patent location history
2014Patents assigned to ARAKAWA SHOTA (1)· patent assignee history
2014Patents assigned to HASEMI RYUJI (1)· patent assignee history
2014Patents assigned to MASUDA TSUNEAKI (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI GAS CHEMICAL CO | 10 | 1995–2021 |
| JAPAN PIONICS | 2 | 2001–2002 |
| ARAKAWA SHOTA | 1 | 2014 |
| HASEMI RYUJIself | 1 | 2014 |
| MASUDA TSUNEAKI | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Niigata, JP | 10 | 1995–2021 |
| Kanagawa, JP | 2 | 2001–2002 |