Inventor
Paul E. Luscher
Inventor
Sunnyvale, CA, US
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
C23CCoating metallic material8%
C30BSingle-crystal growth6%
B08BCleaning in general3%
G01KMeasuring temperature3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
A47JKitchen equipment2%
B65GTransport or storage devices, e.g. conveyors for loading or tipping, shop conveyor systems or pneumatic tube conveyors2%
PatentTitleYear
7,147,719'Double slit-valve doors for plasma processing'20066,916,399'Temperature controlled window with a fluid supply system'20056,899,111'Configurable single substrate wet-dry integrated cluster cleaner'20056,863,835'Magnetic barrier for plasma in chamber exhaust'20056,822,185'Temperature controlled dome-coil system for high power inductively coupled plasma systems'20046,813,534'Endpoint detection in substrate fabrication processes'20046,797,639'Dielectric etch chamber with expanded process window'20046,773,544'Magnetic barrier for plasma in chamber exhaust'20046,716,302'Dielectric etch chamber with expanded process window'20046,647,918'Double slit-valve doors for plasma processing'20036,589,361'Configurable single substrate wet-dry integrated cluster cleaner'20036,575,622'Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using an in-situ wafer temperature optical probe'20036,535,779'Apparatus and method for endpoint control and plasma monitoring'20036,513,452'Adjusting DC bias voltage in plasma chamber'20036,481,886'Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system'20026,432,259'Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates'20026,353,210'Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using and in-situ wafer temperature optical probe'20026,232,236'Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing system'20016,221,782'Adjusting DC bias voltage in plasma chamber'20016,192,827'Double slit-valve doors for plasma processing'20016,076,482'Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion'20005,995,235'Bandpass photon detector'19995,891,350'Adjusting DC bias voltage in plasma chambers'19995,737,177'Apparatus and method for actively controlling the DC potential of a cathode pedestal'19985,253,266'MBE effusion source with asymmetrical heaters'19934,580,035'Apparatus for heating food-warmer plates'19864,508,959'Apparatus for heating stackable dishes'19854,392,453'Molecular beam converters for vacuum coating systems'19834,382,811'Method of producing protective coatings on metal parts to be used in contact with molten glass'19834,201,152'Transfer and temperature monitoring apparatus'1980Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1980–1983Patents assigned to VARIAN ASSOCIATES (2)· patent assignee history
1980–2006Based in Sunnyvale, CA, US· patent location history
1983Patents assigned to CASTOLIN SA (1)· patent assignee history
1983Based in Lausanne, CH· patent location history
1985Based in Bern, CH· patent location history
1986Patents assigned to LUEKON ELEKTROTHERM APP (1)· patent assignee history
1986Based in Tauffelen, CH· patent location history
1993Patents assigned to INTEVAC INC (1)· patent assignee history
1998–2006Patents assigned to APPLIED MATERIALS INC (21)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 21 | 1998–2006 |
| VARIAN ASSOCIATES | 2 | 1980–1983 |
| CASTOLIN SA | 1 | 1983 |
| INTEVAC INC | 1 | 1993 |
| LUEKON ELEKTROTHERM APP | 1 | 1986 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sunnyvale, California, US | 27 | 1980–2006 |
| Tauffelen, CH | 1 | 1986 |
| Bern, CH | 1 | 1985 |
| Lausanne, CH | 1 | 1983 |