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Inventor

Kaeko Kitamura

Inventor
Hyogo, JP

Overview

4→
Patents
1999–2001
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices57%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
C23CCoating metallic material14%
PatentTitleYear
6,265,113'Stress adjustment method of X-ray mask'20016,212,252'X-ray mask provided with an alignment mark and method of manufacturing the same'20015,905,005'X-ray mask and method of fabricating the same'19995,879,840'Film-forming method for X-ray mask'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2001Patents assigned to MITSUBISHI ELECTRIC CORP (4)· patent assignee history
1999–2001Based in Hyogo, JP· patent location history
1999Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI ELECTRIC CORP41999–2001
Locations
LocationPatentsSpan
Hyogo, JP31999–2001
Tokyo, JP11999