Inventor
YAYI WEI
Inventor
CN
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices42%
H01LSemiconductor devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
H10DInorganic electric semiconductor devices8%
PatentTitleYear
12,541,154Optical method and apparatus for quickly realizing precise calibration of lithography system202612,535,742Method and apparatus for correcting proximity effect of electron beam202612,237,213Method for manufacturing semiconductor device202512,222,641Method and device for optimizing mask parameters202512,198,930Method for manufacturing semiconductor device2025Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2025–2026Patents assigned to INST OF MICROELECTRONICS CAS (5)· patent assignee history
2025–2026Based in CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INST OF MICROELECTRONICS CAS | 5 | 2025–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| CN | 5 | 2025–2026 |