LexDanaLexDanabeta
Inventor

Ching-Chang Chen

Inventor
Tainan, TW

Overview

3→
Patents
1999–2021
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
C10GCracking hydrocarbon oils17%
Y10TTechnical subjects covered by former us classification17%
PatentTitleYear
10,948,834Dynamic imaging system202110,928,743Multi-substrate processing on digital lithography systems20215,985,940'Method of mitigating fouling and reducing viscosity in primary fractionators and quench sections of ethylene plants'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999Patents assigned to NALCO EXXON ENERGY CHEM LP (1)· patent assignee history
1999Based in Sugar Land, TX, US· patent location history
2021Patents assigned to APPLIED MATERIALS INC (2)· patent assignee history
2021Based in Tainan, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC22021
NALCO EXXON ENERGY CHEM LP11999
Locations
LocationPatentsSpan
Tainan, TW22021
Sugar Land, Texas, US11999