Inventor
Myoung Soo Kim
Inventor
Suwon-si, KR
Overview
Patents· 64 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
H01LSemiconductor devices10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
H10BElectronic memory devices6%
G09GArrangements or circuits for control of indicating devices using static means to present variable information4%
Y10TTechnical subjects covered by former us classification4%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
C23CCoating metallic material3%
PatentTitleYear
10,854,149Method of driving light-source with improved contrast ratio and display apparatus for performing the method202010,835,893Catalyst carrier module for large-capacity catalytic reactor202010,797,134Integrated circuit devices202010,748,998Semiconductor devices having alternating connecting and separating sections below the gate electrode202010,646,825Metal catalyst support, manufacturing method and apparatus therefor202010,622,312Semiconductor chips and semiconductor packages including the same202010,504,726Nano-scale structures201910,320,186Display drive chip201910,083,649Semiconductor device having a resistor and semiconductor integrated circuit devices using the same20189,935,056Semiconductor chip, method of manufacturing the semiconductor chip, and semiconductor package and display apparatus including the semiconductor chip20189,898,980'Display apparatus'20189,840,059'Fine pattern structures having block co-polymer materials'20179,666,585'Method of manufacturing a semiconductor device having bit line structures disposed in trenches'20179,578,753'Method for manufacturing display device'20179,548,021'Method of driving light-source and display apparatus for performing the method'20179,520,359'Semiconductor device, display driver integrated circuit including the device, and display device including the device'2016D0771165'Milling cutter'20169,418,623'Backlight unit with over-current detection and display device having the same'2016D0753738'Milling cutter'2016D0753201'Milling cutter'20169,257,281'Methods of fabricating a pattern using the block co-polymer materials'20169,202,775'Semiconductor devices having bit line structures disposed in trenches'20159,190,274'Methods of fabricating fine patterns'20159,165,769'Fine pattern structures having block co-polymer materials'20159,147,595'Semiconductor devices having buried metal silicide layers and methods of fabricating the same'20159,086,632'Fine pattern structures having block co-polymer materials and methods of fabricating the same'20159,082,718'Fine pattern structures having block co-polymer materials'20159,062,585'Large-capacity metal catalyst carrier and catalytic converter using same'20158,999,862'Methods of fabricating nano-scale structures and nano-scale structures fabricated thereby'20158,962,491'Methods of fabricating semiconductor devices and semiconductor devices fabricated thereby'20158,906,584'Photomask and method for forming pattern of semiconductor device using the same'20148,416,599'Metal oxide semiconductor (MOS) field effect transistor having trench isolation region and method of fabricating the same'20138,409,516'Monolith, catalyst convertor for purifying exhaust gas using the same and method for manufacturing the catalyst convertor'20138,383,208'Method of fabricating organic light emitting device'20138,300,195'Balance board and liquid crystal display having the same'20128,143,677'Transistor, a transistor arrangement and method thereof'20128,123,553'Conductor base and finger module of air circuit breaker'20128,052,795'Catalyst enhanced chemical vapor deposition apparatus and deposition method using the same'20118,006,639'Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure'20117,942,968'Catalyst enhanced chemical vapor deposition apparatus'20117,868,371'Non-volatile memory device and fabrication method thereof'20117,833,579'Method for in-situ polycrystalline thin film growth'20107,723,203'Method of forming an alignment key having a capping layer and method of fabricating a semiconductor device using the same'20107,696,054'Transistor, a transistor arrangement and method thereof'20107,582,837'Withdraw-in and withdraw-out apparatus for air circuit breaker'20097,422,939'Semiconductor device having one-time programmable ROM and method of fabricating the same'20087,217,985'Semiconductor device including a transistor having low threshold voltage and high breakdown voltage'20077,084,452'Semiconductor device having one-time programmable ROM and method of fabricating the same'20067,041,563'Semiconductor device having a shallow trench isolation and method of fabricating the same'20066,962,840'Method of forming MOS transistor'20056,869,835'Method of forming MOS transistor'20056,727,568'Semiconductor device having a shallow trench isolation and method of fabricating the same'20046,720,667'Semiconductor device having align key for defining active region and method for manufacturing the same'20046,514,666'Photoresist monomers, polymers thereof and photoresist compositions containing it'20036,482,565'Photoresist cross-linker and photoresist composition comprising the same'20026,468,099'Semiconductor device fabricating method'20026,448,130'Method of selectively forming silicide film of merged DRAM and Logic'20026,399,792'Photoresist cross-linker and photoresist composition comprising the same'20026,368,771'Photoresist polymers and photoresist compositions containing the same'20026,368,773'Photoresist cross-linker and photoresist composition comprising the same'20026,319,654'Process for forming a photoresist pattern by top surface imaging process'20016,316,162'Polymer and a forming method of a micro pattern using the same'20016,312,868'Photoresist cross-linker and photoresist composition comprising the same'20016,225,020'Polymer and a forming method of a micro pattern using the same'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2003Patents assigned to HYUNDAI ELECTRONICS IND (9)· patent assignee history
2001–2011Based in Kyungki-do, KR· patent location history
2002–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (23)· patent assignee history
2002–2013Based in Suwon-si, KR· patent location history
2012–2013Patents assigned to KIM MYOUNG-SOO (4)· patent assignee history
2013–2020Patents assigned to SAMSUNG DISPLAY CO LTD (6)· patent assignee history
2013–2020Based in Seoul, KR· patent location history
2014–2019Patents assigned to SK HYNIX INC (13)· patent assignee history
2015–2019Based in Seongnam, KR· patent location history
2016–2020Based in Hwaseong-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 23 | 2002–2020 |
| SK HYNIX INC | 13 | 2014–2019 |
| HYUNDAI ELECTRONICS IND | 9 | 2001–2003 |
| SAMSUNG DISPLAY CO LTD | 6 | 2013–2020 |
| KIM MYOUNG-SOOself | 4 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Suwon-si, KR | 14 | 2002–2013 |
| Kyungki-do, KR | 12 | 2001–2011 |
| Seongnam, KR | 11 | 2015–2019 |
| Hwaseong-si, KR | 7 | 2016–2020 |
| Seoul, KR | 5 | 2013–2020 |