Inventor
Hak-Sun Lee
Inventor
Suwon-si, KR
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1016%
H01LSemiconductor devices14%
H10BElectronic memory devices12%
B82YSpecific uses or applications of nanostructures7%
H10DInorganic electric semiconductor devices7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
A61BDiagnosis2%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems2%
G11BInformation storage based on relative movement between record carrier and transducer2%
PatentTitleYear
10,966,685Method and ultrasound apparatus for providing ultrasound elastography image202110,600,653Method for forming a fine pattern202010,186,485Planarized interlayer dielectric with air gap isolation20199,929,099'Planarized interlayer dielectric with air gap isolation'20189,312,478'Magnetic devices and methods of manufacturing the same'20169,312,181'Semiconductor device, electronic device including the same and manufacturing methods thereof'20169,190,404'Semiconductor device and method of fabricating the same'20158,669,622'Non-volatile semiconductor devices and methods of manufacturing non-volatile semiconductor devices'20148,178,408'Methods of manufacturing charge trap-type non-volatile memory devices'20128,003,469'Method of manufacturing non-volatile semiconductor devices'20117,998,874'Method for forming hard mask patterns having a fine pitch and method for forming a semiconductor device using the same'20117,935,635'Method of forming fine patterns of semiconductor devices using double patterning'20117,601,647'Method of forming fine patterns of semiconductor device using double patterning'20097,576,010'Method of forming pattern using fine pitch hard mask'20097,550,391'Method for forming fine patterns of a semiconductor device using double patterning'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2021Patents assigned to SAMSUNG ELECTRONICS CO LTD (15)· patent assignee history
2009–2020Based in Suwon-si, KR· patent location history
2009Based in Gyeonggi-do, KR· patent location history
2011–2016Based in Seoul, KR· patent location history
2012–2016Patents assigned to LEE HAK-SUN (3)· patent assignee history
2012–2014Patents assigned to SHIN KYOUNG-SUB (2)· patent assignee history
2012Patents assigned to CHOE JEONG-DONG (1)· patent assignee history
2016Patents assigned to JUNG MYUNG-HOON (1)· patent assignee history
2021Based in Seongnam, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 15 | 2009–2021 |
| LEE HAK-SUNself | 3 | 2012–2016 |
| SHIN KYOUNG-SUB | 2 | 2012–2014 |
| CHOE JEONG-DONG | 1 | 2012 |
| JUNG MYUNG-HOON | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Suwon-si, KR | 8 | 2009–2020 |
| Seoul, KR | 5 | 2011–2016 |
| Seongnam, KR | 1 | 2021 |
| Gyeonggi-do, KR | 1 | 2009 |