Inventor
Mitsuru Suehiro
Inventor
Kudamatsu, JP
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
H01JElectric discharge tubes or discharge lamps35%
G01NInvestigating or analysing materials by determining their chemical or physical properties15%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
H05HPlasma technique4%
PatentTitleYear
7,686,917'Plasma processing system and apparatus and a sample processing method'20107,169,254'Plasma processing system and apparatus and a sample processing method'20076,923,885'Plasma processing system and apparatus and a sample processing method'20056,914,005'Plasma etching method'20056,815,365'Plasma etching apparatus and plasma etching method'20046,755,932'Plasma processing system and apparatus and a sample processing method'20046,677,167'Wafer processing apparatus and a wafer stage and a wafer processing method'20046,558,100'Vacuum processing apparatus and a vacuum processing system'20036,549,393'Semiconductor wafer processing apparatus and method'20036,537,012'Vacuum processing apparatus and a vacuum processing system'20036,503,364'Plasma processing apparatus'20036,171,438'Plasma processing apparatus and plasma processing method'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2010Patents assigned to HITACHI LTD (10)· patent assignee history
2001–2010Based in Kudamatsu, JP· patent location history
2004–2005Patents assigned to HITACHI HIGH TECH CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 10 | 2001–2010 |
| HITACHI HIGH TECH CORP | 2 | 2004–2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kudamatsu, JP | 12 | 2001–2010 |