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Inventor

Jae-Hak Choi

Inventor
Seoul, KR

Overview

14→
Patents
2002–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 14 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H02Kprimary
H02KDynamo-electric machines18%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
H02PControl or regulation of electric motors, electric generators or dynamo-electric converters15%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests15%
C07DHeterocyclic compounds9%
Y02PClimate change mitigation technologies in the production or processing of goods6%
B01LChemical or physical laboratory apparatus for general use3%
B81BMicrostructural devices or systems, e.g. micromechanical devices3%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems3%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
PatentTitleYear
10,201,811Method for manufacturing modular microfluidic paper chips using inkjet printing20198,390,237'Starting control apparatus and method for motor'20138,067,920'Starting control apparatus and method for motor'20117,825,560'Motor'20107,791,294'Starting control apparatus and method for motor'20107,782,008'Motor and method for controlling operation of motor'20107,659,650'Self-magnetizing motor and compressor having the same'20107,595,598'Magnetizing motor and magnetizing method thereof'20097,501,735'Self-magnetized motor and stator structure thereof'20096,936,402'MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST COMPOSITIONS COMPRISING POLYMERS PREPARED FROM THE MONOMERS, METHODS FOR PREPARING THE COMPOSITIONS, AND METHODS FOR FORMING PHOTORESIST PATTERNS USING THE COMPOSITIONS'20056,607,868'Photoresist monomers, polymers thereof, and photoresist compositions containing the same'20036,586,154'Photoresist polymers and photoresist compositions containing the same'20036,514,666'Photoresist monomers, polymers thereof and photoresist compositions containing it'20036,492,088'Photoresist monomers polymers thereof and photoresist compositions containing the same'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2003Patents assigned to HYUNDAI ELECTRONICS IND (3)· patent assignee history
2002–2003Based in Kyungki-do, KR· patent location history
2003Based in Ichon-shi, KR· patent location history
2005–2019Based in Daejeon, KR· patent location history
2009–2013Patents assigned to LG ELECTRONICS INC (8)· patent assignee history
2009–2013Based in Seoul, KR· patent location history
2011–2013Patents assigned to CHOI JAE-HAK (2)· patent assignee history
2011–2013Patents assigned to KIM JAE-MIN (2)· patent assignee history
2011–2013Patents assigned to LEE SUNG-HO (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LG ELECTRONICS INC82009–2013
HYUNDAI ELECTRONICS IND32002–2003
CHOI JAE-HAKself22011–2013
KIM JAE-MIN22011–2013
LEE SUNG-HO22011–2013
Locations
LocationPatentsSpan
Seoul, KR82009–2013
Kyungki-do, KR32002–2003
Daejeon, KR22005–2019
Ichon-shi, KR12003