Inventor
GUOHENG ZHAO
Inventor
US
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties32%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
G02BOptical elements, systems or apparatus9%
G06TImage data processing or generation, in general9%
G01BMeasuring length, thickness or similar linear dimensions8%
H01LSemiconductor devices8%
C23CCoating metallic material6%
H10KOrganic electric solid-state devices4%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
G01PMeasuring linear or angular speed, acceleration, deceleration, or shock2%
PatentTitleYear
12,578,285Gas flow configurations for semiconductor inspections202612,535,431Sample inspection with multiple measurement modes202612,444,630Single-material waveplates for pupil polarization filtering202512,322,620Reflective waveplates for pupil polarization filtering202512,288,350Image based metrology of surface deformations202512,225,808In-line monitoring of OLED layer thickness and dopant concentration202511,908,716Image-based in-situ process monitoring202411,856,833In-line monitoring of OLED layer thickness and dopant concentration202311,609,183Methods and systems to measure properties of products on a moving blade in electronic device manufacturing machines202311,441,992Method and apparatus for detection of particle size in a fluid202211,442,000In-situ, real-time detection of particulate defects in a fluid202211,417,010Image based metrology of surface deformations202211,366,069Simultaneous multi-directional laser wafer inspection202211,287,248Method and system for optical three dimensional topography measurement202211,226,234Spectrum shaping devices and techniques for optical characterization applications202211,187,654Imaging reflectometer202111,156,566High sensitivity image-based reflectometry202111,150,078High sensitivity image-based reflectometry2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to APPLIED MATERIALS INC (12)· patent assignee history
2021–2026Based in US· patent location history
2022Patents assigned to KLA TENCOR CORP (2)· patent assignee history
2025–2026Patents assigned to KLA CORP (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 12 | 2021–2025 |
| KLA CORP | 4 | 2025–2026 |
| KLA TENCOR CORP | 2 | 2022 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 18 | 2021–2026 |