Inventor
Mukund Srinivasan
Inventor
Fremont, CA, US
Overview
Patents· 39 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H01JElectric discharge tubes or discharge lamps21%
H01LSemiconductor devices17%
C23CCoating metallic material10%
H04LTransmission of digital information, e.g. telegraphic communication3%
Y10TTechnical subjects covered by former us classification3%
G06FElectric digital data processing2%
H02KDynamo-electric machines2%
H10BElectronic memory devices2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
PatentTitleYear
10,999,185Wireless-system flow control and packet scheduler interface202110,734,265Semiconductor process equipment202010,707,116Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions202010,565,615System and method for personalized add-on purchase202010,475,644Dielectric-metal stack for 3D flash memory application201910,460,936Photo-assisted deposition of flowable films201910,403,535Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system201910,380,077System and method for upload and synchronization of media content to cloud based media services201910,332,727Methods for processing substrates using small plasma chambers201910,236,197Processing system containing an isolation region separating a deposition chamber from a treatment chamber201910,056,279Semiconductor process equipment201810,041,167Cyclic sequential processes for forming high quality thin films201810,033,812Framework for distributed key-value store in a wide area network20189,972,487Dielectric-metal stack for 3D flash memory application20189,911,578'Small plasma chamber systems and methods'20189,624,577'Deposition of metal doped amorphous carbon film'20179,613,908'Ultra-thin dielectric diffusion barrier and etch stop layer for advanced interconnect applications'20179,412,581'Low-K dielectric gapfill by flowable deposition'20169,412,613'Development of high etch selective hardmask material by ion implantation into amorphous carbon films'20169,406,509'Deposition of heteroatom-doped carbon films'20169,111,729'Small plasma chamber systems and methods'20158,911,590'Integrated capacitive and inductive power sources for a plasma etching chamber'20148,622,021'High lifetime consumable silicon nitride-silicon dioxide plasma processing components'20148,576,866'Hierarchical rate limiting of control packets'20138,337,713'Methods for RF pulsing of a narrow gap capacitively coupled reactor'20128,097,120'Process tuning gas injection from the substrate edge'20127,976,673'RF pulsing of a narrow gap capacitively coupled reactor'20117,749,353'High aspect ratio etch using modulation of RF powers of various frequencies'20107,645,707'Etch profile control'20107,547,635'Process for etching dielectric films with improved resist and/or etch profile characteristics'20097,405,521'Multiple frequency plasma processor method and apparatus'20087,144,521'High aspect ratio etch using modulation of RF powers of various frequencies'20067,094,315'Chamber configuration for confining a plasma'20066,984,288'Plasma processor in plasma confinement region within a vacuum chamber'20066,942,816'Methods of reducing photoresist distortion while etching in a plasma processing system'20056,872,281'Chamber configuration for confining a plasma'20056,824,627'Stepped upper electrode for plasma processing uniformity'20046,714,033'Probe for direct wafer potential measurements'20046,391,787'Stepped upper electrode for plasma processing uniformity'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2019Patents assigned to LAM RES CORP (20)· patent assignee history
2002–2020Based in Fremont, CA, US· patent location history
2012–2015Patents assigned to SRINIVASAN MUKUND (6)· patent assignee history
2012–2015Patents assigned to DHINDSA RAJINDER (3)· patent assignee history
2013–2021Patents assigned to ERICSSON TELEFON AB L M (2)· patent assignee history
2016–2020Patents assigned to APPLIED MATERIALS INC (14)· patent assignee history
2018Based in Lexington, MA, US· patent location history
2019Based in Bangalore, IN· patent location history
2020Based in Palatine, IL, US· patent location history
2021Based in Stockholm, SE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 20 | 2002–2019 |
| APPLIED MATERIALS INC | 14 | 2016–2020 |
| SRINIVASAN MUKUNDself | 6 | 2012–2015 |
| DHINDSA RAJINDER | 3 | 2012–2015 |
| ERICSSON TELEFON AB L M | 2 | 2013–2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fremont, California, US | 34 | 2002–2020 |
| Stockholm, SE | 1 | 2021 |
| Palatine, Illinois, US | 1 | 2020 |
| Bangalore, IN | 1 | 2019 |
| Lexington, Massachusetts, US | 1 | 2018 |