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Inventor

Zhou Mei Sheng

Inventor
Singapore, SG

Overview

2→
Patents
2000–2003
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Jprimary
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light33%
H01JElectric discharge tubes or discharge lamps33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
6,660,642'Toxic residual gas removal by non-reactive ion sputtering'20036,124,927'Method to protect chamber wall from etching by endpoint plasma clean'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2003Patents assigned to CHARTERED SEMICONDUCTOR MFG (2)· patent assignee history
2000–2003Based in Singapore, SG· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CHARTERED SEMICONDUCTOR MFG22000–2003
Locations
LocationPatentsSpan
Singapore, SG22000–2003