LexDanaLexDanabeta
Inventor

Sue Siyang Zhang

Inventor
Saratoga, CA, US

Overview

47→
Patents
1998–2017
Patent span
Physics
Primary field (CPC G)

Patents· 47 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G11Bprimary
G11BInformation storage based on relative movement between record carrier and transducer58%
Y10TTechnical subjects covered by former us classification28%
C23FNon-mechanical removal of metallic material from surface3%
B82YSpecific uses or applications of nanostructures1%
C09GPolishing compositions1%
C23CCoating metallic material1%
C25DProcesses for the electrolytic or electrophoretic production of coatings1%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them1%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices1%
H01FMagnets1%
PatentTitleYear
9,548,069'Method for producing a smooth Ru side gap of a damascene writer pole'20179,449,635'Method for forming a magnetic head for perpendicular magnetic recording'20169,311,935'Method and apparatus for magnetic recording head having a waveguide'20168,988,824'Method for manufacturing a magnetic write pole with a consistent bevel angle'20158,730,617'Tapered leading and side shields for use in a perpendicular magnetic recording head'20148,724,258'Slanted bump design for magnetic shields in perpendicular write heads and method of making same'20148,646,168'Method for manufacturing a magnetic write pole of a perpendicular magnetic write head using novel mask fabrication'20148,568,601'Fenceless main pole definition for advanced perpendicular magnetic write head'20138,503,131'Perpendicular magnetic write head having a novel shield structure'20138,498,078'Magnetic head with flared write pole having multiple tapered regions'20138,422,168'Magnetic write head having a self-aligned side wrap-around shield with multi-angle slanted bump'20138,397,371'Process of manufacturing low resistance damascene coils'20138,371,019'Method for manufacturing a magnetic write pole having straight side walls and a well defined track-width'20138,252,190'Method for manufacturing a magnetic write head having a hard mask defined write pole trailing edge step'20128,233,234'Stepped main pole for perpendicular write heads in hard disk drives and method of making same'20128,189,292'Method for manufacturing a magnetic write head having a write pole with a trailing edge taper using a Rieable hard mask'20128,136,228'Method for manufacturing a magnetic write head'20128,108,985'Method for manufacturing a perpendicular magnetic write head'20128,085,497'Method of multi-angled bump processing for magnetic pole fabrication and systems thereof'20118,066,892'Method for manufacturing a perpendicular magnetic write head with a wrap around shield'20117,990,651'Method of manufacturing a perpendicular magnetic write head with stepped trailing magnetic shield with electrical lapping guide control'20117,950,137'Method for manufacturing a magnetic write head'20117,881,010'Process for self-aligned flare point and shield throat definition prior to main pole patterning'20117,788,798'Method for manufacturing a perpendicular magnetic write head with wrap around magnetic trailing and side shields'20107,770,283'Method of fabricating a magnetic head'20107,743,487'Method to planarize perpendicular write poles using a combination of CMP and reactive ion milling'20107,715,147'Magnetic write head having a shield that extends below the leading edge of the write pole'20107,648,731'Fabricating perpendicular write elements in perpendicular magnetic recording heads'20107,588,884'Method for enhancing wafer alignment marks'20097,563,381'High milling resistance write pole fabrication method for perpendicular recording'20097,520,048'Method of fabricating a GMR head'20097,477,481'Bilayer trailing shield gap for perpendicular head'20097,469,467'Method of manufacturing a perpendicular write head'20087,441,325'Perpendicular head with trailing shield and rhodium gap process'20087,429,493'Method for fabricating a magnetic head for perpendicular recording using a CMP lift-off and resistant layer'20087,397,634'Magnetic head coil system and damascene/reactive ion etching method for manufacturing the same'20087,396,768'Copper damascene chemical mechanical polishing (CMP) for thin film head writer fabrication'20087,380,332'Magnetic head coil system and damascene/reactive ion etching method for manufacturing the same'20087,292,408'Bilayer coil insulation for magnetic write heads to minimize pole recession'20077,251,878'Method and apparatus for defining leading edge taper of a write pole tip'20077,212,380'Magnetic write head with recessed overcoat'20077,130,153'Stitched write head with staircase P2 defined throat height'20067,110,217'Write head design with improved bump to control write saturation'20067,108,796'Method for fabrication of magnetic write head with self aligned poles'20067,037,847'Methods for fabricating read sensor for magnetic heads with reduced read track width'20066,919,280'Method of removing magnetoresistive sensor cap by reactive ion etching'20055,740,009'Apparatus for improving wafer and chuck edge protection'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998Based in Milpitas, CA, US· patent location history
2005–2010Patents assigned to HITACHI GLOBAL STORAGE TECH (23)· patent assignee history
2005–2017Based in Saratoga, CA, US· patent location history
2011–2014Patents assigned to ZHENG YI (13)· patent assignee history
2011–2014Patents assigned to ZHANG SUE SIYANG (12)· patent assignee history
2011–2013Patents assigned to HITACHI GLOBAL STORAGE TECH NL (11)· patent assignee history
2013–2017Patents assigned to HGST Netherlands BV (12)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI GLOBAL STORAGE TECH232005–2010
ZHENG YI132011–2014
HGST Netherlands BV122013–2017
ZHANG SUE SIYANGself122011–2014
HITACHI GLOBAL STORAGE TECH NL112011–2013
Locations
LocationPatentsSpan
Saratoga, California, US462005–2017
Milpitas, California, US11998