Inventor
Jun Takayasu
Inventor
Yokkaichi, JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
B24BMachines, devices, or processes for grinding or polishing17%
H01LSemiconductor devices14%
C02FTreatment of water, waste water, sewage, or sludge7%
C09GPolishing compositions7%
H10DInorganic electric semiconductor devices5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
A46BBrushes2%
B08BCleaning in general2%
B24CAbrasive or related blasting with particulate material2%
PatentTitleYear
10,441,979Cleaning apparatus and cleaning method201910,249,518Polishing device and polishing method20199,947,555Semiconductor manufacturing apparatus and method of manufacturing semiconductor device20189,902,038'Polishing apparatus, polishing method, and semiconductor manufacturing method'20189,539,696'Retainer ring, polish apparatus, and polish method'20179,502,318'Polish apparatus, polish method, and method of manufacturing semiconductor device'20169,296,083'Polishing apparatus and polishing method'20168,823,079'Semiconductor device and method for manufacturing same'20147,037,839'Method for polishing organic film on semiconductor substrate by use of resin particles, and slurry'20066,878,631'Abrasive used for planarization of semiconductor device and method of manufacturing semiconductor device using the abrasive'20056,723,226'Method and apparatus for forming electrolytic water and apparatus for washing semiconductor substrate using electrolytic water-forming apparatus'20046,354,913'Abrasive and method for polishing semiconductor substrate'20026,098,638'Method of manufacturing a semiconductor device and an apparatus for manufacturing the same'20006,007,696'Apparatus and method for manufacturing electrolytic ionic water and washing method using electroyltic ionic water'19996,001,238'Method for purifying pure water and an apparatus for the same'19995,665,464'Carbon fiber-reinforced carbon composite material and process for the preparation thereof'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997Patents assigned to TONEN CORP (1)· patent assignee history
1997Based in Saitama, JP· patent location history
1999–2017Patents assigned to TOSHIBA KK (11)· patent assignee history
1999–2004Based in Kawasaki, JP· patent location history
1999Based in Kanagawa, JP· patent location history
2002Patents assigned to TOKUYAMA CORP (1)· patent assignee history
2005–2019Based in Yokkaichi, JP· patent location history
2014Based in Mie, JP· patent location history
2018–2019Patents assigned to TOSHIBA MEMORY CORP (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 11 | 1999–2017 |
| TOSHIBA MEMORY CORP | 4 | 2018–2019 |
| TOKUYAMA CORP | 1 | 2002 |
| TONEN CORP | 1 | 1997 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokkaichi, JP | 9 | 2005–2019 |
| Kawasaki, JP | 4 | 1999–2004 |
| Mie, JP | 1 | 2014 |
| Kanagawa, JP | 1 | 1999 |
| Saitama, JP | 1 | 1997 |