Inventor
Makoto Sakakibara
Inventor
Tokyo, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps39%
B82YSpecific uses or applications of nanostructures6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
B21DWorking or processing of sheet metal or metal tubes, rods or profiles without essentially removing material3%
B23KSoldering or unsoldering3%
B29CShaping or joining of plastics3%
B29LIndexing scheme associated with subclass b29c, relating to particular articles3%
B60HArrangements of heating, cooling, ventilating or other air-treating devices specially adapted for passenger or goods spaces of vehicles3%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments3%
C23CCoating metallic material3%
PatentTitleYear
10,825,649Electron beam device202010,755,396Image forming apparatus202010,707,047Measuring device and measuring method202010,636,618Charged particle beam apparatus202010,361,063Charged particle detector and charged particle beam device using the same201910,319,562Charged particle beam device201910,217,604Charged particle beam apparatus201910,184,595Duct and method of manufacturing the same201910,014,160Scanning electron microscope and method for controlling same20189,966,225Charged particle beam device, simulation method, and simulation device20189,520,266'Pattern critical dimension measurement equipment and method for measuring pattern critical dimension'20169,287,082'Charged particle beam apparatus'20167,939,780'Abnormality determination and estimation method, and abnormality determination and estimation device for weld product'20117,425,714'Measurement method of electron beam current, electron beam writing system and electron beam detector'20087,423,274'Electron beam writing system and electron beam writing method'20087,112,619'Water-based ink'20066,858,321'Corrosion resistant member'20056,730,780'Water-based ink'20045,590,208'Speaker system'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2006Patents assigned to KAO CORP (2)· patent assignee history
2004–2006Based in Wakayama, JP· patent location history
2008–2020Patents assigned to HITACHI HIGH TECH CORP (8)· patent assignee history
2008Patents assigned to CANON KK (2)· patent assignee history
2008Based in Kokubunji, JP· patent location history
2011Patents assigned to DENSO CORP (1)· patent assignee history
2011Based in Handa, JP· patent location history
2016–2020Based in Tokyo, JP· patent location history
2018–2020Patents assigned to HITACHI LTD (5)· patent assignee history
2019Based in Anjo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI HIGH TECH CORP | 8 | 2008–2020 |
| HITACHI LTD | 5 | 2018–2020 |
| CANON KK | 2 | 2008 |
| KAO CORP | 2 | 2004–2006 |
| DENSO CORP | 1 | 2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 11 | 2016–2020 |
| Kokubunji, JP | 2 | 2008 |
| Wakayama, JP | 2 | 2004–2006 |
| Anjo, JP | 1 | 2019 |
| Handa, JP | 1 | 2011 |