Inventor
Fung Ka Hing
Inventor
Hsinchu, TW
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices45%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%
H01LSemiconductor devices9%
PatentTitleYear
8,952,459'Gate structure having lightly doped region'20158,558,289'Transistors having a composite strain structure, integrated circuits, and fabrication methods thereof'20138,535,998'Method for fabricating a gate structure'20138,405,160'Multi-strained source/drain structures'20137,759,210'Method for forming a MOS device with reduced transient enhanced diffusion'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2015Patents assigned to TAIWAN SEMICONDUCTOR MFG (5)· patent assignee history
2010–2015Based in Hsinchu, TW· patent location history
2013Patents assigned to CHENG CHUN-FAI (3)· patent assignee history
2013Patents assigned to HING FUNG KA (3)· patent assignee history
2013Patents assigned to TSAI HAN-TING (2)· patent assignee history
2013Patents assigned to WANG HAITING (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG | 5 | 2010–2015 |
| CHENG CHUN-FAI | 3 | 2013 |
| HING FUNG KAself | 3 | 2013 |
| TSAI HAN-TING | 2 | 2013 |
| WANG HAITING | 2 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 5 | 2010–2015 |