LexDanaLexDanabeta
Inventor

Richard Johannes Franciscus Van Haren

Inventor
Waalre, NL

Overview

67→
Patents
2005–2020
Patent span
Physics
Primary field (CPC G)

Patents· 67 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices52%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
G01BMeasuring length, thickness or similar linear dimensions4%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
G06FElectric digital data processing3%
Y10TTechnical subjects covered by former us classification3%
H01LSemiconductor devices2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
PatentTitleYear
10,788,761Determining an optimal operational parameter setting of a metrology system202010,719,011Method and apparatus to correct for patterning process error202010,718,604Metrology method, target and substrate202010,691,863Method and apparatus to correct for patterning process error202010,642,162Methods and apparatus for obtaining diagnostic information relating to an industrial process202010,545,410Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product202010,495,986Patterning device cooling system and method of thermally conditioning a patterning device201910,474,045Lithographic apparatus and device manufacturing method201910,386,176Metrology method, target and substrate201910,331,043Optimization of target arrangement and associated target201910,324,379Lithographic apparatus and method201910,274,834Methods and apparatus for obtaining diagnostic information relating to an industrial process201910,162,272Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method201810,061,212Metrology target, method and apparatus, target design method, computer program and lithographic system201810,025,193Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product20189,946,165Methods and apparatus for obtaining diagnostic information relating to an industrial process20189,879,988'Metrology method and apparatus, computer program and lithographic system'20189,753,377'Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatus'20179,506,743'Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method'20169,291,916'Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods'20168,980,724'Alignment target contrast in a lithographic double patterning process'20158,982,329'Method and apparatus for measuring line end shortening, substrate and patterning device'20158,982,347'Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatus'20158,976,355'Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods'20158,722,179'Substrate comprising a mark'20148,709,908'Improving alignment target contrast in a lithographic double patterning process'20148,625,096'Method and system for increasing alignment target contrast'20148,609,441'Substrate comprising a mark'20138,329,366'Apparatus and method for providing resist alignment marks in a double patterning lithographic process'20128,319,967'Marker structure and method of forming the same'20128,264,664'Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method'20128,252,491'Method of forming a marker, substrate having a marker and device manufacturing method'20128,203,692'Sub-segmented alignment mark arrangement'20128,139,217'Alignment systems and methods for lithographic systems'20128,115,938'Method of providing alignment marks, device manufacturing method and lithographic apparatus'20128,072,615'Alignment method, alignment system, and product with alignment mark'20118,029,953'Lithographic apparatus and device manufacturing method with double exposure overlay control'20117,989,303'Method of creating an alignment mark on a substrate and substrate'20117,944,063'Application of 2-dimensional photonic crystals in alignment devices'20117,916,276'Lithographic apparatus and device manufacturing method with double exposure overlay control'20117,897,058'Device manufacturing method and computer program product'20117,880,880'Alignment systems and methods for lithographic systems'20117,879,682'Marker structure and method for controlling alignment of layers of a multi-layered substrate'20117,863,763'Binary sinusoidal sub-wavelength gratings as alignment marks'20117,821,650'Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement'20107,759,029'Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby'20107,737,566'Alignment devices and methods for providing phase depth control'20107,687,209'Lithographic apparatus and device manufacturing method with double exposure overlay control'20107,629,697'Marker structure and method for controlling alignment of layers of a multi-layered substrate'20097,619,738'Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus'20097,573,574'Lithographic apparatus and device manufacturing method'20097,550,379'Alignment mark, use of a hard mask material, and method'20097,486,408'Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement'20097,476,490'Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method'20097,466,413'Marker structure, mask pattern, alignment method and lithographic method and apparatus'20087,462,548'Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby'20087,460,231'Alignment tool for a lithographic apparatus'20087,453,161'Marker for alignment of non-transparent gate layer, method for manufacturing such a marker, and use of such a marker in a lithographic apparatus'20087,439,531'Alignment systems and methods for lithographic systems'20087,332,732'Alignment systems and methods for lithographic systems'20087,329,888'Alignment systems and methods for lithographic systems'20087,330,261'Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus'20087,297,971'Alignment systems and methods for lithographic systems'20077,271,073'Marker for alignment of non-transparent gate layer, method for manufacturing such a marker, and use of such a marker in a lithographic apparatus'20077,112,813'Device inspection method and apparatus using an asymmetric marker'20067,056,805'Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby'20066,858,948'Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2020Patents assigned to ASML NETHERLANDS BV (66)· patent assignee history
2005–2019Based in Veldhoven, NL· patent location history
2007–2020Based in Waalre, NL· patent location history
2011–2015Patents assigned to VAN HAREN RICHARD JOHANNES FRANCISCUS (14)· patent assignee history
2011–2016Patents assigned to ASML HOLDING NV (6)· patent assignee history
2012–2014Patents assigned to DOYTCHEVA MAYA ANGELOVA (4)· patent assignee history
2012–2014Patents assigned to DUSA MIRCEA (3)· patent assignee history
2018Based in Waarle, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV662005–2020
VAN HAREN RICHARD JOHANNES FRANCISCUSself142011–2015
ASML HOLDING NV62011–2016
DOYTCHEVA MAYA ANGELOVA42012–2014
DUSA MIRCEA32012–2014
Locations
LocationPatentsSpan
Waalre, NL512007–2020
Veldhoven, NL152005–2019
Waarle, NL12018