Inventor
HITOSHI KATO
Inventor
JP
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material27%
H01LSemiconductor devices23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H01JElectric discharge tubes or discharge lamps14%
A61HPhysical therapy apparatus, e.g. devices for locating or stimulating reflex points in the body2%
A61MDevices for introducing media into, or onto, the body2%
A63BApparatus for physical training, gymnastics, swimming, climbing, or fencing2%
B05BSpraying apparatus2%
B05CApparatus for applying fluent materials to surfaces, in general2%
F24FAir-conditioning2%
PatentTitleYear
12,594,468Grommet and racket202612,368,030Deposition method and deposition apparatus202512,205,817Method for depositing film and film deposition system202512,152,807Liquid atomizing apparatus202412,051,566Plasma processing apparatus202411,952,661Deposition method202411,905,595Film deposition apparatus and film deposition method202411,823,865Plasma generation apparatus, deposition apparatus using the same, and deposition method202311,710,633Deposition method and deposition apparatus202311,674,225Substrate processing apparatus202311,664,201Substrate holding mechanism and substrate processing apparatus202311,655,539Film deposition apparatus and film deposition method202311,572,625Rotation detection jig, substrate processing apparatus and method of operating the substrate processing apparatus202311,519,067Method for depositing a silicon nitride film and film deposition apparatus202211,417,521Film forming method and film forming apparatus202211,359,279Cleaning method and film deposition method202211,264,266Substrate processing method202211,248,294Substrate processing apparatus202211,155,918Film forming apparatus202111,136,669Film formation apparatus2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to TOKYO ELECTRON LTD (18)· patent assignee history
2021Patents assigned to TOKYO ELECTRON LIMIIED (1)· patent assignee history
2021–2026Based in JP· patent location history
2023Patents assigned to TOKYO ELECTRON LIMTED (1)· patent assignee history
2024Patents assigned to NORITAKE CO LTD (1)· patent assignee history
2026Patents assigned to YONEX CO LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 18 | 2021–2025 |
| NORITAKE CO LTD | 1 | 2024 |
| TOKYO ELECTRON LIMIIED | 1 | 2021 |
| TOKYO ELECTRON LIMTED | 1 | 2023 |
| YONEX CO LTD | 1 | 2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 20 | 2021–2026 |