Inventor
Takuji Ishikawa
Inventor
Settsu, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds16%
C07CAcyclic or carbocyclic compounds14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy9%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution9%
C08LCompositions of macromolecular compounds7%
Y02PClimate change mitigation technologies in the production or processing of goods7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium5%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%
PatentTitleYear
10,787,587Aqueous dispersion, coating film, and coated article20209,444,103'Electrode mixture'20169,444,104'Electrode mixture'20169,343,744'Binder, cathode mixture and anode mixture'20169,109,095'Organosol composition of fluorine-containing polymer'20158,338,652'Process for producing 2,3,3,3-tetrafluoropropene'20127,777,075'Fluoroethercarboxylic acid and production method thereof, surfactant, method of producing fluoropolymer and aqueous dispersion used thereof'20107,649,118'Process for preparing fluorine-containing norbornene derivative'20107,511,179'Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer'20097,482,415'Process for producing fluoroionomer, method for purification and concentration of the ionomer, and method of film formation'20097,186,773'Process for preparing fluorine-containing norbornene derivative'20077,163,982'Process for preparing fluorine-containing polymer and method of forming fine pattern using same'20077,115,690'Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer'20066,908,724'Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2020Patents assigned to DAIKIN IND LTD (13)· patent assignee history
2005–2016Based in Settsu, JP· patent location history
2007Patents assigned to DAIKI IND LTD (1)· patent assignee history
2010–2020Based in Osaka, JP· patent location history
2012–2015Patents assigned to ISHIKAWA TAKUJI (2)· patent assignee history
2015Patents assigned to FUKATANI TOMOYUKI (1)· patent assignee history
2015Patents assigned to KITAHARA TAKAHIRO (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DAIKIN IND LTD | 13 | 2005–2020 |
| ISHIKAWA TAKUJIself | 2 | 2012–2015 |
| DAIKI IND LTD | 1 | 2007 |
| FUKATANI TOMOYUKI | 1 | 2015 |
| KITAHARA TAKAHIRO | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Settsu, JP | 12 | 2005–2016 |
| Osaka, JP | 2 | 2010–2020 |