Inventor

Masashi Ohmori

Inventor

Itami, JP

Overview

18→

Patents

1991–2004

Patent span

Electricity

Primary field (CPC H)

Patents· 18 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests23%

G01NInvestigating or analysing materials by determining their chemical or physical properties11%

B08BCleaning in general9%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%

F02DControlling combustion engines5%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%

B82YSpecific uses or applications of nanostructures2%

C23CCoating metallic material2%

F02BInternal-combustion piston engines2%

PatentTitleYear

6,715,944'Apparatus for removing photoresist film'2004 6,517,999'Method of removing photoresist film'2003 6,255,127'Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the same'2001 6,124,142'Method for analyzing minute foreign substance elements'2000 5,877,035'Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the same'1999 5,590,672'Semiconductor cleaning apparatus and wafer cassette'1997 5,568,821'Semiconductor cleaning apparatus and wafer cassette'1996 5,551,459'Semiconductor cleaning apparatus and wafer cassette'1996 5,517,027'Method for detecting and examining slightly irregular surface states, scanning probe microscope therefor, and method for fabricating a semiconductor device or a liquid crystal display device using these'1996 5,470,392'Semiconductor device processing method'1995 5,445,171'Semiconductor cleaning apparatus and wafer cassette'1995 5,432,601'Fine particle analyzing device'1995 5,383,482'Semiconductor processing apparatus and module'1995 5,379,785'Cleaning apparatus'1995 5,193,509'Fuel control system for automotive power plant'1993 5,187,118'Method of manufacturing semiconductor devices'1993 5,076,207'Apparatus for atmospheric chemical vapor deposition'1991 4,982,567'Air supply control systems for turbocharged internal combustion engines'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2004Patents assigned to MITSUBISHI ELECTRIC CORP (16)· patent assignee history

1991–1993Patents assigned to MAZDA MOTOR (2)· patent assignee history

1991–1999Based in Itami, JP· patent location history

1991–1993Based in Hiroshima, JP· patent location history

1999–2001Patents assigned to SEIKO INSTR INC (3)· patent assignee history

2000–2001Based in Hyogo, JP· patent location history

2003–2004Patents assigned to SHIMADA RIKA KOUGYO KABUSHIKI (2)· patent assignee history

2003–2004Based in Shizuoka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MITSUBISHI ELECTRIC CORP	16	1991–2004
SEIKO INSTR INC	3	1999–2001
MAZDA MOTOR	2	1991–1993
SHIMADA RIKA KOUGYO KABUSHIKI	2	2003–2004

Locations

Location	Patents	Span
Itami, JP	12	1991–1999
Shizuoka, JP	2	2003–2004
Hyogo, JP	2	2000–2001
Hiroshima, JP	2	1991–1993