Inventor
Norm Shendon
Inventor
San Carlos, CA, US
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B24Bprimary
B24BMachines, devices, or processes for grinding or polishing67%
B08BCleaning in general17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
7,255,632'Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion'20077,238,090'Polishing apparatus having a trough'20077,097,544'Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion'20066,503,134'Carrier head for a chemical mechanical polishing apparatus'20036,336,851'Substrate belt polisher'20026,267,656'Carrier head for a chemical mechanical polishing apparatus'20016,245,680'Circumferentially oscillating carousel apparatus for sequentially processing substrates for polishing and cleaning'20016,136,715'Circumferentially oscillating carousel apparatus for sequentially polishing substrates'20006,126,517'System for chemical mechanical polishing having multiple polishing stations'20006,080,046'Underwater wafer storage and wafer picking for chemical mechanical polishing'20006,051,499'Apparatus and method for distribution of slurry in a chemical mechanical polishing system'20006,019,671'Carrier head for a chemical/mechanical polishing apparatus and method of polishing'20005,961,372'Substrate belt polisher'19995,951,373'Circumferentially oscillating carousel apparatus for sequentially processing substrates for polishing and cleaning'19995,913,718'Head for a chemical mechanical polishing apparatus'19995,899,800'Chemical mechanical polishing apparatus with orbital polishing'19995,820,448'Carrier head with a layer of conformable material for a chemical mechanical polishing system'19985,795,215'Method and apparatus for using a retaining ring to control the edge effect'19985,738,574'Continuous processing system for chemical mechanical polishing'19985,709,593'Apparatus and method for distribution of slurry in a chemical mechanical polishing system'19985,681,215'Carrier head design for a chemical mechanical polishing apparatus'19975,643,053'Chemical mechanical polishing apparatus with improved polishing control'19975,582,534'Orbital chemical mechanical polishing apparatus and method'19965,205,082'Wafer polisher head having floating retainer ring'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993Patents assigned to CYBEQ SYST INC (1)· patent assignee history
1993–2007Based in San Carlos, CA, US· patent location history
1996–2007Patents assigned to APPLIED MATERIALS INC (23)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 23 | 1996–2007 |
| CYBEQ SYST INC | 1 | 1993 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Carlos, California, US | 24 | 1993–2007 |