Inventor
ERIC A. HUDSON
Inventor
US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H01JElectric discharge tubes or discharge lamps20%
H01LSemiconductor devices13%
B05DProcesses for applying fluent materials to surfaces, in general7%
C22CAlloys7%
C23CCoating metallic material7%
F01DNon-positive displacement machines or engines, e.g. steam turbines7%
F05DIndexing scheme for aspects relating to non-positive-displacement machines or engines, gas-turbines or jet-propulsion plants7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
PatentTitleYear
12,488,992High aspect ratio dielectric etch with chlorine202512,479,004Selective attachment to enhance SiO202512,435,412High density, modulus, and hardness amorphous carbon films at low pressure202512,354,880High aspect ratio etch with infinite selectivity202511,313,242Thin seal for an engine2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022Patents assigned to RAYTHEON TECH CORP (1)· patent assignee history
2022–2025Based in US· patent location history
2025Patents assigned to LAM RES CORP (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 4 | 2025 |
| RAYTHEON TECH CORP | 1 | 2022 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 5 | 2022–2025 |