Inventor
Simon Reinald HUISMAN
Inventor
NL
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices68%
G02BOptical elements, systems or apparatus16%
G01BMeasuring length, thickness or similar linear dimensions6%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
PatentTitleYear
12,591,184Enhanced alignment for a photolithographic apparatus202612,585,198Lithographic apparatus, multi-wavelength phase-modulated scanning metrology system and method202612,585,201Metrology mark structure and method of determining metrology mark structure202612,572,083Intensity order difference based metrology system, lithographic apparatus, and methods thereof202612,326,669Illumination apparatus and associated metrology and lithographic apparatuses202512,282,263Metrology system and lithographic system202512,124,177Overlay measurement system using lock-in amplifier technique202412,025,925Metrology method and lithographic apparatuses202411,906,906Metrology method and associated metrology and lithographic apparatuses202411,815,675Metrology device and phase modulator apparatus therefor comprising a first moving grating and a first compensatory grating element202311,803,130Phase modulators in alignment to decrease mark size202311,762,305Alignment method202311,556,068Detection system for an alignment sensor202311,474,435Metrology sensor, illumination system and method of generating measurement illumination with a configurable illumination spot diameter202211,409,206Alignment method and apparatus202211,360,399Metrology sensor for position metrology202211,333,985Position sensor202211,300,892Sensor apparatus and method for lithographic measurements202211,221,565Level sensor and lithographic apparatus202211,181,835Metrology sensor, lithographic apparatus and method for manufacturing devices202111,175,593Alignment sensor apparatus for process sensitivity compensation2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to ASML NETHERLANDS BV (21)· patent assignee history
2021–2026Patents assigned to ASML HOLDING NV (7)· patent assignee history
2021–2026Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 21 | 2021–2026 |
| ASML HOLDING NV | 7 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 21 | 2021–2026 |