Inventor

Kurt D. Sieber

Inventor
Rochester, NY, US

Overview

32→
Patents
1985–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 32 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material11%
H01LSemiconductor devices11%
H10NElectric solid-state devices not otherwise provided for8%
G03CPhotosensitive materials for photographic purposes6%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
C09KMaterials for miscellaneous applications, not provided for elsewhere5%
H02NElectric machines not otherwise provided for5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
B41JTypewriters4%
B41MPrinting, duplicating, marking, or copying processes4%
PatentTitleYear
10,818,835Inertial piezoelectric device202010,777,732Piezoelectric composite articles202010,763,422Composite article with co-planar electrodes202010,763,424Composite articles with dielectric layer202010,763,421Piezoelectric article with dielectric layer and co-planar electrodes202010,305,022Silver-containing electrically-conductive compositions201910,297,741Electrically-conductive compositions20199,976,216Atomic-layer deposition apparatus20189,711,333'Non-planar radial-flow plasma treatment system'20179,528,184'Atomic-layer deposition method using compound gas jet'20169,506,147'Atomic-layer deposition apparatus using compound gas jet'20169,499,908'Atomic layer deposition apparatus'20169,499,906'Coating substrate using bernoulli atomic-layer deposition'20168,937,016'Substrate preparation for selective area deposition'20158,921,236'Patterning for selective area deposition'20148,840,981'Microfluidic device with multilayer coating'20148,567,909'Printhead for inkjet printing device'20138,419,176'Aqueous compositions with improved silicon corrosion characteristics'20138,029,105'Ambient plasma treatment of printer components'20117,214,464'High speed positive-working photothermographic radiographic film'20077,074,549'Photothermographic materials containing phosphors and methods of using same'20067,041,608'Providing fluorocarbon layers on conductive electrodes in making electronic devices such as OLED devices'20066,603,121'High-efficiency plasma treatment of paper'20036,565,930'High-efficiency plasma treatment of paper'20036,399,159'High-efficiency plasma treatment of polyolefins'20025,742,401'Laser-exposed thermal recording element'19985,693,254'Cesium-zinc halide phosphors, phosphor screens, and preparation methods'19975,670,086'Vitrified phosphor articles, intermediates, and preparation methods'19975,391,884'Barium gadolinate phosphor activated by terbium and/or samarium'19955,132,192'Ordered corundum magnesium tantalum niobium oxide x-ray intensifying screens'1992D0311952'Humidifier'19904,508,551'Steam distributor'1985

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1985–1990Patents assigned to CONDAIR AG (2)· patent assignee history
1985–1990Based in Ettingen, CH· patent location history
1992–2020Patents assigned to EASTMAN KODAK CO (30)· patent assignee history
1992–2020Based in Rochester, NY, US· patent location history
2013–2015Patents assigned to SIEBER KURT D (5)· patent assignee history
2014–2015Patents assigned to ELLINGER CAROLYN R (2)· patent assignee history
2014–2015Patents assigned to NELSON SHELBY F (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EASTMAN KODAK CO301992–2020
SIEBER KURT Dself52013–2015
CONDAIR AG21985–1990
ELLINGER CAROLYN R22014–2015
NELSON SHELBY F22014–2015
Locations
LocationPatentsSpan
Rochester, New York, US301992–2020
Ettingen, CH21985–1990