Inventor
Charles T. Kroll
Inventor
Raleigh, NC, US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H10BElectronic memory devices25%
H10DInorganic electric semiconductor devices17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
4,656,729'Dual electron injection structure and process with self-limiting oxidation barrier'19874,458,407'Process for fabricating semi-conductive oxide between two poly silicon gate electrodes'19844,423,547'Method for forming dense multilevel interconnection metallurgy for semiconductor devices'19844,030,942'Semiconductor masking for device fabrication utilizing ion implantation and other methods'19773,978,577'Fixed and variable threshold N-channel MNOSFET integration technique'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–1987Patents assigned to IBM (5)· patent assignee history
1976–1977Based in Essex Center, VT, US· patent location history
1984–1987Based in Raleigh, NC, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 5 | 1976–1987 |
Locations
| Location | Patents | Span |
|---|---|---|
| Raleigh, NC, US | 3 | 1984–1987 |
| Essex Center, VT, US | 2 | 1976–1977 |